Abstract
InSb films have been grown by rf sputtering on cleaved BaF2, CaF2, NaCl, and NaI substrates in addition to polished and annealed (111) -oriented CaF2 wafers. Growth temperatures investigated ranged from 40 to 300 °C, while deposition rates R ranged from 20 to 450 Å/min. The epitaxial temperature for InSb was found to decrease with decreasing deposition rate and decreasing film-substrate lattice mismatch. Stoichiometric single-crystal films were grown on cleaved BaF2 substrates at temperatures as low as 150 °C at R=20 Å/min. Polycrystalline films grown on cleaved CaF2 exhibited a greater degree of preferred orientation than films on polished and annealed CaF2, but the grain size was always less for a given growth temperature. The maximum grain size was related to the film thickness. The electrical properties of 2000-Å-thick polycrystalline InSb films on polished and annealed CaF2 were investigated. The room-temperature electron carrier concentration and Hall mobility of films grown at 300 °C were 4×1017 cm−3 and 200 cm2/V sec, respectively. The dominant charge-scattering mechanism was identified as potential-barrier scattering at either high- or low-angle grain boundaries depending on the grain size of the film.
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Dates
Type | When |
---|---|
Created | 22 years, 6 months ago (Feb. 14, 2003, 4:11 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 4, 2024, 2:19 p.m.) |
Indexed | 1 year, 6 months ago (Feb. 5, 2024, 11:03 a.m.) |
Issued | 49 years, 1 month ago (Aug. 1, 1976) |
Published | 49 years, 1 month ago (Aug. 1, 1976) |
Published Print | 49 years, 1 month ago (Aug. 1, 1976) |
@article{Greene_1976, title={Structural and electrical characteristics of InSb thin films grown by rf sputtering}, volume={47}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.323170}, DOI={10.1063/1.323170}, number={8}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Greene, J. E. and Wickersham, C. E.}, year={1976}, month=aug, pages={3630–3639} }