DOI: 10.1063/1.322842. Electromigration in thin aluminum films on titanium nitride

Electromigration in thin aluminum films on titanium nitride

10.1063/1.322842

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

The aluminum electromigration drift velocity was measured at the temperature range 250–400 °C. A threshold current density was found inversely proportional to the stripe length. An activation energy of 0.65 eV was found for the drift velocity. The occurrence of the threshold is explained by opposing chemical gradients created by the atom pile-up and depletion at the stripe ends. The threshold may explain several observations reported previously. The threshold is increased by decreasing the temperature or by enclosing the aluminum in silicon nitride. Virtually no electromigration is seen for very short aluminum stripes even at current densities above 106 A/cm2.

Bibliography

Blech, I. A. (1976). Electromigration in thin aluminum films on titanium nitride. Journal of Applied Physics, 47(4), 1203â1208.

Authors 1

I. A. Blech (first)

References 18 Referenced 1,130

{'key': '2023061702434205300_r1'}
10.1109/PROC.1971.8447 / Proc. IEEE (1971)
10.1016/0022-3697(61)90138-X / J. Phys. Chem. Solids (1961)
10.1063/1.1657425 / J. Appl. Phys. (1969)
{'key': '2023061702434205300_r4a', 'first-page': '762', 'volume': '43', 'year': '1972', 'journal-title': 'J. Appl. Phys.'} / J. Appl. Phys. (1972)
10.1016/0040-6090(72)90169-1 / Thin Solid Films (1972)
10.1016/0040-6090(69)90035-2 / Thin Solid Films (1969)
{'key': '2023061702434205300_r7', 'first-page': '338', 'volume': 'ED-16', 'year': '1969', 'journal-title': 'IEEE Trans. Electron Devices'} / IEEE Trans. Electron Devices (1969)
10.1016/0040-6090(75)90052-8 / Thin Solid Films (1975)
10.1063/1.1654097 / Appl. Phys. Lett. (1972)
10.1063/1.1653018 / Appl. Phys. Lett. (1970)
10.1063/1.1653799 / Appl. Phys. Lett. (1971)
10.1016/0001-6160(70)90133-1 / Acta Metall. (1970)
10.1063/1.1658316 / J. Appl. Phys. (1970)
{'key': '2023061702434205300_r14'}
10.1063/1.1662058 / J. Appl. Phys. (1973)
{'key': '2023061702434205300_r16'}
10.1016/0040-6090(72)90164-2 / Thin Solid Films (1972)

Dates

Type	When
Created	22 years, 6 months ago (Feb. 14, 2003, 11:11 a.m.)
Deposited	2 years, 2 months ago (June 16, 2023, 8:45 p.m.)
Indexed	1 day ago (Aug. 23, 2025, 12:59 a.m.)
Issued	49 years, 4 months ago (April 1, 1976)
Published	49 years, 4 months ago (April 1, 1976)
Published Online	16 years, 11 months ago (Aug. 28, 2008)
Published Print	49 years, 4 months ago (April 1, 1976)

Funders 0

None

BibTeX

@article{Blech_1976, title={Electromigration in thin aluminum films on titanium nitride}, volume={47}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.322842}, DOI={10.1063/1.322842}, number={4}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Blech, I. A.}, year={1976}, month=apr, pages={1203–1208} }

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