Abstract
Silicon nanowires with axially varying n- and p-doping were grown by the vapor-liquid-solid approach using gold as the catalyst. The nanowire sidewalls exhibit periodic nanofaceting, which is found to be dopant-dependent. It is shown that the nanofaceting occurs during the enhanced sidewall growth that arises when the diborane dopant gas is introduced. The nanowires are axially oriented along ⟨111⟩, and the crystallographic planes on which the nanofaceting occurs are determined to be {111} and {100}.
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Dates
Type | When |
---|---|
Created | 16 years, 2 months ago (July 2, 2009, 6:20 p.m.) |
Deposited | 2 years, 2 months ago (July 2, 2023, 7:56 p.m.) |
Indexed | 1 month ago (July 30, 2025, 6:53 a.m.) |
Issued | 16 years, 2 months ago (June 29, 2009) |
Published | 16 years, 2 months ago (June 29, 2009) |
Published Online | 16 years, 2 months ago (July 1, 2009) |
Published Print | 16 years, 2 months ago (June 29, 2009) |
@article{Li_2009, title={Doping-dependent nanofaceting on silicon nanowire surfaces}, volume={94}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.3155434}, DOI={10.1063/1.3155434}, number={26}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Li, Fang and Nellist, Peter D. and Cockayne, David J. H.}, year={2009}, month=jun }