Abstract
The crystallization of amorphous Ge2Sb2Te5 (GST) doped with nitrogen is studied with pulsed laser heating. The crystallization time of sputter-deposited films is increased by doping by as much as 100× for nitrogen concentrations of the order of 12 at. % in as-deposited amorphous films. Suppression of the formation of critical crystal nuclei is found to be responsible. The crystallization of melt-quenched amorphous material is also slowed by doping but less dramatically.
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Dates
Type | When |
---|---|
Created | 16 years, 2 months ago (May 22, 2009, 4:10 a.m.) |
Deposited | 2 years ago (July 29, 2023, 1:31 a.m.) |
Indexed | 3 weeks ago (July 30, 2025, 6:53 a.m.) |
Issued | 16 years, 3 months ago (May 15, 2009) |
Published | 16 years, 3 months ago (May 15, 2009) |
Published Online | 16 years, 3 months ago (May 20, 2009) |
Published Print | 16 years, 3 months ago (May 15, 2009) |
@article{Shelby_2009, title={Crystallization dynamics of nitrogen-doped Ge2Sb2Te5}, volume={105}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.3126501}, DOI={10.1063/1.3126501}, number={10}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Shelby, Robert M. and Raoux, Simone}, year={2009}, month=may }