DOI: 10.1063/1.3041152. Strain evolution in Al conductor lines during electromigration

Strain evolution in Al conductor lines during electromigration

10.1063/1.3041152

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

Monochromatic and white beam synchrotron x rays were used to study the deviatoric strains and full elastic strains in passivated Al conductor lines with near-bamboo structures during electromigration (EM) at 190 °C. A strong strain gradient formed in the upstream part of the Al lines. Strains along the downstream part of the lines were smaller and more scattered. Numerical analysis using the Eshelby model and finite element method (FEM) calculations suggest that the moving of atoms during EM in these near-bamboo Al lines is dominated by top and/or bottom interface diffusion, which differs from the reported results for nonbamboo, polycrystalline Al conductor lines, where EM is mainly along the grain boundaries. Local strain measurements and FEM calculations indicate that the EM flux is also nonuniform across the width of the conductor line because of stronger mechanical constraint by the passivation layer near the edges of the line. Plastic deformation is observed during EM by changes in the Laue diffraction patterns. The effective valence |Z∗|=1.8±0.4 is determined from the measured strain gradient.

Bibliography

Zhang, H., Cargill, G. S., Ge, Y., Maniatty, A. M., & Liu, W. (2008). Strain evolution in Al conductor lines during electromigration. Journal of Applied Physics, 104(12).

Authors 5

H. Zhang (first)
G. S. Cargill (additional)
Y. Ge (additional)
A. M. Maniatty (additional)
W. Liu (additional)

References 26 Referenced 14

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Dates

Type	When
Created	16 years, 7 months ago (Jan. 7, 2009, 10:55 a.m.)
Deposited	2 years, 1 month ago (July 13, 2023, 8:33 p.m.)
Indexed	3 weeks, 2 days ago (July 30, 2025, 6:52 a.m.)
Issued	16 years, 8 months ago (Dec. 15, 2008)
Published	16 years, 8 months ago (Dec. 15, 2008)
Published Online	16 years, 7 months ago (Dec. 31, 2008)
Published Print	16 years, 8 months ago (Dec. 15, 2008)

Funders 0

None

BibTeX

@article{Zhang_2008, title={Strain evolution in Al conductor lines during electromigration}, volume={104}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.3041152}, DOI={10.1063/1.3041152}, number={12}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Zhang, H. and Cargill, G. S. and Ge, Y. and Maniatty, A. M. and Liu, W.}, year={2008}, month=dec }

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  "abstract": "<jats:p>Monochromatic and white beam synchrotron x rays were used to study the deviatoric strains and full elastic strains in passivated Al conductor lines with near-bamboo structures during electromigration (EM) at 190\u2009\u00b0C. A strong strain gradient formed in the upstream part of the Al lines. Strains along the downstream part of the lines were smaller and more scattered. Numerical analysis using the Eshelby model and finite element method (FEM) calculations suggest that the moving of atoms during EM in these near-bamboo Al lines is dominated by top and/or bottom interface diffusion, which differs from the reported results for nonbamboo, polycrystalline Al conductor lines, where EM is mainly along the grain boundaries. Local strain measurements and FEM calculations indicate that the EM flux is also nonuniform across the width of the conductor line because of stronger mechanical constraint by the passivation layer near the edges of the line. Plastic deformation is observed during EM by changes in the Laue diffraction patterns. The effective valence |Z\u2217|=1.8\u00b10.4 is determined from the measured strain gradient.</jats:p>",
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