Abstract
The characteristics and mechanism of conduction/set process in TiN∕ZnO∕Pt-based resistance random access memory devices with stable and reproducible nanosecond bipolar switching behavior were studied. The dependencies of memory behavior on cell area, operating temperature, and frequency indicate that the conduction mechanism in low-resistance states is due to electrons hopping through filament paths. We also identify that the set process is essentially equivalent to a soft dielectric breakdown associated with a polarization effect caused by the migration of space charges under a low electric field stress. The generation/recovery of oxygen vacancies and nonlattice oxygen ions play a critical role in resistance switching.
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Dates
Type | When |
---|---|
Created | 17 years, 2 months ago (June 13, 2008, 10:49 p.m.) |
Deposited | 2 years ago (July 31, 2023, 6:24 p.m.) |
Indexed | 4 weeks, 2 days ago (July 30, 2025, 6:51 a.m.) |
Issued | 17 years, 2 months ago (June 9, 2008) |
Published | 17 years, 2 months ago (June 9, 2008) |
Published Online | 17 years, 2 months ago (June 13, 2008) |
Published Print | 17 years, 2 months ago (June 9, 2008) |
@article{Xu_2008, title={Characteristics and mechanism of conduction/set process in TiN竏瓢nO竏姫t resistance switching random-access memories}, volume={92}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.2945278}, DOI={10.1063/1.2945278}, number={23}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Xu, Nuo and Liu, Lifeng and Sun, Xiao and Liu, Xiaoyan and Han, Dedong and Wang, Yi and Han, Ruqi and Kang, Jinfeng and Yu, Bin}, year={2008}, month=jun }