Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

This work reports on the detection of the valence band of buried Heusler compounds by means of hard x-ray photoemission spectroscopy. The measurements have been performed on the so-called “half” tunnel junctions that are thin films of Co2MnSi underneath MgO. Starting from the substrate, the structure of the samples is MgO(buffer)–Co2MnSi–MgO(tMgO)–AlOx with a thickness tMgO of the upper MgO layer of 2 and 20nm. The valence band x-ray photoemission spectra have been excited by hard x rays of about 6keV energy. The valence band spectra have been used to estimate the mean free path of the electrons through the MgO layer to be 17nm at kinetic energies of about 6keV. In particular, it is shown that the buried Co2MnSi films exhibit the same valence density of states as in bulk samples.

Bibliography

Fecher, G. H., Balke, B., Gloskowskii, A., Ouardi, S., Felser, C., Ishikawa, T., Yamamoto, M., Yamashita, Y., Yoshikawa, H., Ueda, S., & Kobayashi, K. (2008). Detection of the valence band in buried Co2MnSi–MgO tunnel junctions by means of photoemission spectroscopy. Applied Physics Letters, 92(19).

Authors 11
  1. Gerhard H. Fecher (first)
  2. Benjamin Balke (additional)
  3. Andrei Gloskowskii (additional)
  4. Siham Ouardi (additional)
  5. Claudia Felser (additional)
  6. Takayuki Ishikawa (additional)
  7. Masafumi Yamamoto (additional)
  8. Yoshiyuki Yamashita (additional)
  9. Hideki Yoshikawa (additional)
  10. Shigenori Ueda (additional)
  11. Keisuke Kobayashi (additional)
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Dates
Type When
Created 17 years, 3 months ago (May 17, 2008, 6:11 p.m.)
Deposited 2 years ago (Aug. 3, 2023, 7:02 p.m.)
Indexed 3 weeks, 6 days ago (Aug. 2, 2025, 12:31 a.m.)
Issued 17 years, 3 months ago (May 12, 2008)
Published 17 years, 3 months ago (May 12, 2008)
Published Online 17 years, 3 months ago (May 16, 2008)
Published Print 17 years, 3 months ago (May 12, 2008)
Funders 0

None

@article{Fecher_2008, title={Detection of the valence band in buried Co2MnSi–MgO tunnel junctions by means of photoemission spectroscopy}, volume={92}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.2931089}, DOI={10.1063/1.2931089}, number={19}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Fecher, Gerhard H. and Balke, Benjamin and Gloskowskii, Andrei and Ouardi, Siham and Felser, Claudia and Ishikawa, Takayuki and Yamamoto, Masafumi and Yamashita, Yoshiyuki and Yoshikawa, Hideki and Ueda, Shigenori and Kobayashi, Keisuke}, year={2008}, month=may }