DOI: 10.1063/1.2896637. A solid phase reaction between TiCx thin films and Al2O3 substrates

A solid phase reaction between TiCx thin films and Al2O3 substrates

10.1063/1.2896637

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

Ti C x thin films were deposited on Al2O3 substrates at 900°C by using a multiple cathode high current pulsed cathodic arc. The Ti:C pulse ratio and, hence, the composition was varied from C rich to Ti rich. It is found that the Al2O3 substrate is decomposed and reacts with the TiCx film to incorporate significant amounts of O and Al in the growing film. When the stoichiometry is suitable, epitaxially oriented Ti2AlC MAX phase with significant O incorporated is formed. The results indicate that Al2O3 is not an ideal substrate material for the growth of transition metal carbides and MAX phase thin films.

Bibliography

Persson, P. O. Ã., Rosen, J., McKenzie, D. R., Bilek, M. M. M., & HÃ¶glund, C. (2008). A solid phase reaction between TiCx thin films and Al2O3 substrates. Journal of Applied Physics, 103(6).

Authors 5

P. O. Å. Persson (first)
J. Rosen (additional)
D. R. McKenzie (additional)
M. M. M. Bilek (additional)
C. Höglund (additional)

References 12 Referenced 21

10.1016/0079-6786(71)90016-1 / Prog. Solid State Chem. (1971)
10.1511/2001.4.334 / Am. Sci. (2001)
10.1103/PhysRevB.70.165401 / Phys. Rev. B (2004)
10.1016/j.jcrysgro.2006.03.008 / J. Cryst. Growth (2006)
10.1103/PhysRevLett.89.176102 / Phys. Rev. Lett. (2002)
10.1016/j.actamat.2007.04.006 / Acta Mater. (2007)
10.1016/j.tsf.2004.11.163 / Thin Solid Films (2005)
10.1063/1.2709571 / J. Appl. Phys. (2007)
10.1016/S0254-0584(03)00185-8 / Mater. Chem. Phys. (2003)
10.1103/PhysRevB.70.045106 / Phys. Rev. B (2004)
10.1016/j.surfcoat.2006.07.133 / Surf. Coat. Technol. (2007)
10.1063/1.2838456 / Appl. Phys. Lett. (2008)

Dates

Type	When
Created	17 years, 5 months ago (March 17, 2008, 6:45 p.m.)
Deposited	2 years, 1 month ago (June 30, 2023, 3 p.m.)
Indexed	3 weeks, 1 day ago (July 30, 2025, 6:51 a.m.)
Issued	17 years, 5 months ago (March 15, 2008)
Published	17 years, 5 months ago (March 15, 2008)
Published Online	17 years, 5 months ago (March 17, 2008)
Published Print	17 years, 5 months ago (March 15, 2008)

Funders 0

None

BibTeX

@article{Persson_2008, title={A solid phase reaction between TiCx thin films and Al2O3 substrates}, volume={103}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.2896637}, DOI={10.1063/1.2896637}, number={6}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Persson, P. O. Å. and Rosen, J. and McKenzie, D. R. and Bilek, M. M. M. and Höglund, C.}, year={2008}, month=mar }

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