DOI: 10.1063/1.2885090. Indentation depth dependence of the mechanical strength of Ni films

Indentation depth dependence of the mechanical strength of Ni films

10.1063/1.2885090

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

The indentation depth effect has been systematically examined on the mechanical properties of electrodeposited nickel films under 0% and 10% tensile strains. It is found that the indentation depth is proportional to the square root of the loads applied and the depth profiles of hardness and elastic modulus follow the similar trend of change with maximal values at the surface skins. The hardness and modulus then attenuate to a value of about half of the maximum, which follows the model proposed by Graca et al., Surf. Coat. Technol. (in press) with the mechanism of geometrically necessary dislocations and surface free energy. We suggest that the effect of surface oxidation and surface bond contraction [C. Q. Sun, Prog. Solid State Chem. 35, 1 (2007)] contributes intrinsically to the anomalous skin strengthening because of the local strain and energy trapping caused by surface bonds breaking.

Bibliography

Ma, Z., Long, S., Pan, Y., & Zhou, Y. (2008). Indentation depth dependence of the mechanical strength of Ni films. Journal of Applied Physics, 103(4).

Authors 4

Zengsheng Ma (first)
Shiguo Long (additional)
Yong Pan (additional)
Yichun Zhou (additional)

References 33 Referenced 37

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Dates

Type	When
Created	17 years, 6 months ago (March 3, 2008, 9:38 a.m.)
Deposited	2 years, 2 months ago (July 5, 2023, 2:33 p.m.)
Indexed	1 month ago (July 30, 2025, 6:50 a.m.)
Issued	17 years, 6 months ago (Feb. 15, 2008)
Published	17 years, 6 months ago (Feb. 15, 2008)
Published Online	17 years, 6 months ago (Feb. 29, 2008)
Published Print	17 years, 6 months ago (Feb. 15, 2008)

Funders 0

None

BibTeX

@article{Ma_2008, title={Indentation depth dependence of the mechanical strength of Ni films}, volume={103}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.2885090}, DOI={10.1063/1.2885090}, number={4}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Ma, Zengsheng and Long, Shiguo and Pan, Yong and Zhou, Yichun}, year={2008}, month=feb }

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