Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

For high density of resistive random access memory applications using NiOx films, understanding of the filament formation mechanism that occurred during the application of electric fields is required. We show the structural changes of polycrystalline NiOx (x=1–1.5) film in the set (low resistance), reset (high resistance), and switching failed (irreversible low resistance) states investigated by simultaneous high-resolution transmission electron microscopy and electron energy-loss spectroscopy. We have found that the irreversible low resistance state facilitates further increases of Ni filament channels and Ni filament density that resulted from the grain structure changes in the NiOx film.

Bibliography

Park, G.-S., Li, X.-S., Kim, D.-C., Jung, R.-J., Lee, M.-J., & Seo, S. (2007). Observation of electric-field induced Ni filament channels in polycrystalline NiOx film. Applied Physics Letters, 91(22).

Authors 6
  1. Gyeong-Su Park (first)
  2. Xiang-Shu Li (additional)
  3. Dong-Chirl Kim (additional)
  4. Ran-Ju Jung (additional)
  5. Myoung-Jae Lee (additional)
  6. Sunae Seo (additional)
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Dates
Type When
Created 17 years, 9 months ago (Nov. 26, 2007, 6:48 p.m.)
Deposited 2 years, 2 months ago (July 2, 2023, 12:04 p.m.)
Indexed 1 week, 4 days ago (Aug. 23, 2025, 1:03 a.m.)
Issued 17 years, 9 months ago (Nov. 26, 2007)
Published 17 years, 9 months ago (Nov. 26, 2007)
Published Online 17 years, 9 months ago (Nov. 26, 2007)
Published Print 17 years, 9 months ago (Nov. 26, 2007)
Funders 0

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