Crossref journal-article
AIP Publishing
Journal of Applied Physics (317)
Abstract

This study provides a deeper insight into the chemistry and physics of the common engineering practice of using a proximity cap, while annealing compound semiconductors such as GaAs. We have studied the cases of a GaAs proximity cap, a Si proximity cap, and no proximity cap. Using x-ray photoelectron spectroscopy, it has been found that annealing increases the gallium to arsenic ratio in the oxide layer in all cases. During the annealing of UV-ozone oxidized GaAs, it has been observed that GaAs proximity caps also serve as a sacrificial layer to accelerate the desorption of oxide species. In all cases surface deterioration due to pit formation has been observed, and the depth of pits is found to depend on the effective role played by the capping material. Energy dispersive x-ray analysis provides additional evidence that pits mainly consist of elemental As and gallium oxide, with most of the elemental As situated at the pit-substrate interface. Deposition of a thin layer of gold and subsequent annealing to 500°C for 300s under different capping conditions shows the use of a proximate cap to be practically insignificant in annealing Au deposited films.

Bibliography

Ghosh, S. C., Biesinger, M. C., LaPierre, R. R., & Kruse, P. (2007). The role of proximity caps during the annealing of UV-ozone oxidized GaAs. Journal of Applied Physics, 101(11).

Authors 4
  1. S. C. Ghosh (first)
  2. M. C. Biesinger (additional)
  3. R. R. LaPierre (additional)
  4. P. Kruse (additional)
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Dates
Type When
Created 18 years, 2 months ago (June 14, 2007, 6:07 p.m.)
Deposited 2 years ago (Aug. 5, 2023, 1:05 a.m.)
Indexed 1 month ago (July 30, 2025, 6:49 a.m.)
Issued 18 years, 3 months ago (June 1, 2007)
Published 18 years, 3 months ago (June 1, 2007)
Published Online 18 years, 2 months ago (June 14, 2007)
Published Print 18 years, 3 months ago (June 1, 2007)
Funders 0

None

@article{Ghosh_2007, title={The role of proximity caps during the annealing of UV-ozone oxidized GaAs}, volume={101}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.2740359}, DOI={10.1063/1.2740359}, number={11}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Ghosh, S. C. and Biesinger, M. C. and LaPierre, R. R. and Kruse, P.}, year={2007}, month=jun }