DOI: 10.1063/1.2336999. Ferroelectric thin films: Review of materials, properties, and applications

Ferroelectric thin films: Review of materials, properties, and applications

10.1063/1.2336999

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

An overview of the state of art in ferroelectric thin films is presented. First, we review applications: microsystems’ applications, applications in high frequency electronics, and memories based on ferroelectric materials. The second section deals with materials, structure (domains, in particular), and size effects. Properties of thin films that are important for applications are then addressed: polarization reversal and properties related to the reliability of ferroelectric memories, piezoelectric nonlinearity of ferroelectric films which is relevant to microsystems’ applications, and permittivity and loss in ferroelectric films—important in all applications and essential in high frequency devices. In the context of properties we also discuss nanoscale probing of ferroelectrics. Finally, we comment on two important emerging topics: multiferroic materials and ferroelectric one-dimensional nanostructures.

Bibliography

Setter, N., Damjanovic, D., Eng, L., Fox, G., Gevorgian, S., Hong, S., Kingon, A., Kohlstedt, H., Park, N. Y., Stephenson, G. B., Stolitchnov, I., Taganstev, A. K., Taylor, D. V., Yamada, T., & Streiffer, S. (2006). Ferroelectric thin films: Review of materials, properties, and applications. Journal of Applied Physics, 100(5).

Authors 15

N. Setter (first)
D. Damjanovic (additional)
L. Eng (additional)
G. Fox (additional)
S. Gevorgian (additional)
S. Hong (additional)
A. Kingon (additional)
H. Kohlstedt (additional)
N. Y. Park (additional)
G. B. Stephenson (additional)
I. Stolitchnov (additional)
A. K. Taganstev (additional)
D. V. Taylor (additional)
T. Yamada (additional)
S. Streiffer (additional)

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Dates

Type	When
Created	18 years, 11 months ago (Sept. 20, 2006, 6:24 p.m.)
Deposited	2 years ago (Aug. 3, 2023, 4:04 p.m.)
Indexed	47 minutes ago (Aug. 21, 2025, 6:06 a.m.)
Issued	18 years, 11 months ago (Sept. 1, 2006)
Published	18 years, 11 months ago (Sept. 1, 2006)
Published Online	18 years, 11 months ago (Sept. 12, 2006)
Published Print	18 years, 11 months ago (Sept. 1, 2006)

Funders 0

None

BibTeX

@article{Setter_2006, title={Ferroelectric thin films: Review of materials, properties, and applications}, volume={100}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.2336999}, DOI={10.1063/1.2336999}, number={5}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Setter, N. and Damjanovic, D. and Eng, L. and Fox, G. and Gevorgian, S. and Hong, S. and Kingon, A. and Kohlstedt, H. and Park, N. Y. and Stephenson, G. B. and Stolitchnov, I. and Taganstev, A. K. and Taylor, D. V. and Yamada, T. and Streiffer, S.}, year={2006}, month=sep }

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  "abstract": "<jats:p>An overview of the state of art in ferroelectric thin films is presented. First, we review applications: microsystems\u2019 applications, applications in high frequency electronics, and memories based on ferroelectric materials. The second section deals with materials, structure (domains, in particular), and size effects. Properties of thin films that are important for applications are then addressed: polarization reversal and properties related to the reliability of ferroelectric memories, piezoelectric nonlinearity of ferroelectric films which is relevant to microsystems\u2019 applications, and permittivity and loss in ferroelectric films\u2014important in all applications and essential in high frequency devices. In the context of properties we also discuss nanoscale probing of ferroelectrics. Finally, we comment on two important emerging topics: multiferroic materials and ferroelectric one-dimensional nanostructures.</jats:p>",
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