Abstract
Room temperature electron mobility of 1170cm2∕Vs is obtained in an undoped, lattice-matched, Al0.82In0.18N∕GaN field-effect transistor heterostructure, while keeping a high (2.6±0.3)×1013cm−2 electron gas density intrinsic to the Al0.82In0.18N∕GaN material system. This results in a two-dimensional sheet resistance of 210Ω∕◻. The high mobility of these layers, grown by metal-organic vapor phase epitaxy on sapphire substrate, is obtained thanks to the insertion of an optimized AlN interlayer, reducing the alloy related interface roughness scattering.
References
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Dates
Type | When |
---|---|
Created | 19 years ago (Aug. 10, 2006, 9:29 p.m.) |
Deposited | 2 years, 1 month ago (June 22, 2023, 8:44 p.m.) |
Indexed | 1 week, 2 days ago (Aug. 12, 2025, 6:11 p.m.) |
Issued | 19 years ago (Aug. 7, 2006) |
Published | 19 years ago (Aug. 7, 2006) |
Published Online | 19 years ago (Aug. 9, 2006) |
Published Print | 19 years ago (Aug. 7, 2006) |
@article{Gonschorek_2006, title={High electron mobility lattice-matched AlInN∕GaN field-effect transistor heterostructures}, volume={89}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.2335390}, DOI={10.1063/1.2335390}, number={6}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Gonschorek, M. and Carlin, J.-F. and Feltin, E. and Py, M. A. and Grandjean, N.}, year={2006}, month=aug }