DOI: 10.1063/1.2218824. Hydrogen plasma dry etching method for field emission application

Hydrogen plasma dry etching method for field emission application

10.1063/1.2218824

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

The ability to fabricate large-area, uniform emitters is an important factor in many vacuum microelectronics applications, especially for field emission displays. In this letter, we measured the field emission properties of uniform silicon nanowire emitters prepared by hydrogen plasma etching using in situ high-resolution scanning electron microscopy and a tungsten anode of 1μm diameter. Our results indicate that the field emission properties are improved upon increasing the etching time; this process sharpens the nanowires’ geometry and lowers their work function. These highly uniform (with respect to length, diameter, and distribution) nanowires display great potential for application within many field emission nanoelectronics devices.

Bibliography

Cheng, T. C., Shieh, J., Huang, W. J., Yang, M. C., Cheng, M. H., Lin, H. M., & Chang, M. N. (2006). Hydrogen plasma dry etching method for field emission application. Applied Physics Letters, 88(26).

Authors 7

T. C. Cheng (first)
J. Shieh (additional)
W. J. Huang (additional)
M. C. Yang (additional)
M. H. Cheng (additional)
H. M. Lin (additional)
M. N. Chang (additional)

References 19 Referenced 29

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Dates

Type	When
Created	19 years ago (Aug. 9, 2006, 1:02 p.m.)
Deposited	3 months, 1 week ago (May 29, 2025, 2:05 p.m.)
Indexed	1 month ago (July 30, 2025, 6:47 a.m.)
Issued	19 years, 2 months ago (June 26, 2006)
Published	19 years, 2 months ago (June 26, 2006)
Published Online	19 years, 2 months ago (June 30, 2006)
Published Print	19 years, 2 months ago (June 26, 2006)

Funders 0

None

BibTeX

@article{Cheng_2006, title={Hydrogen plasma dry etching method for field emission application}, volume={88}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.2218824}, DOI={10.1063/1.2218824}, number={26}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Cheng, T. C. and Shieh, J. and Huang, W. J. and Yang, M. C. and Cheng, M. H. and Lin, H. M. and Chang, M. N.}, year={2006}, month=jun }

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