Abstract
Epitaxial films of a deep-ultraviolet transparent oxide semiconductor, Ga2O3, were fabricated on α-Al2O3 (0001) substrates by pulsed laser deposition. Four-axes x-ray diffraction measurements revealed that the tin-doped Ga2O3 films have a crystal structure different from any known polymorphs of Ga2O3. Its crystal lattice was determined to be an orthorhombic. Top gate field-effect transistor structures were fabricated using the Ga2O3 epitaxial films for n-channels. The channel conductance was modulated by an order of magnitude by gate voltage at room temperature with an estimated field-effect mobility of 5×10−2cm2(Vs)−1.
References
24
Referenced
136
10.1063/1.126915
/ Appl. Phys. Lett. (2000)10.1063/1.127015
/ Appl. Phys. Lett. (2000)10.1038/nmat1284
/ Nat. Mater. (2004)10.1063/1.1498874
/ Appl. Phys. Lett. (2002){'key': '2023070303040757600_c5', 'first-page': '1069', 'volume': '389–393', 'year': '2002', 'journal-title': 'Mater. Sci. Forum'}
/ Mater. Sci. Forum (2002)10.1016/j.diamond.2003.11.089
/ Diamond Relat. Mater. (2004)10.1063/1.1542677
/ Appl. Phys. Lett. (2003)10.1143/JJAP.42.L347
/ Jpn. J. Appl. Phys., Part 2 (2003)10.1126/science.1083212
/ Science (2003)10.1038/nature03090
/ Nature (London) (2004)10.1063/1.1862767
/ J. Appl. Phys. (2005)10.1126/science.251.5000.1468
/ Science (1991)10.1109/68.942666
/ IEEE Photonics Technol. Lett. (2001)10.1016/j.jnoncrysol.2004.08.220
/ J. Non-Cryst. Solids (2004)10.1063/1.116085
/ Appl. Phys. Lett. (1996)10.1109/16.925234
/ IEEE Trans. Electron Devices (2001)10.1063/1.119233
/ Appl. Phys. Lett. (1997)10.1063/1.1330559
/ Appl. Phys. Lett. (2000)10.1016/S0040-6090(02)00202-X
/ Thin Solid Films (2002)10.1063/1.1731237
/ J. Chem. Phys. (1960){'volume-title': 'High Resolution X-Ray Scattering from Thin Films and Multilayers', 'year': '1999', 'key': '2023070303040757600_c21'}
/ High Resolution X-Ray Scattering from Thin Films and Multilayers (1999){'key': '2023070303040757600_c22', 'first-page': '192', 'volume': '43', 'year': '1999', 'journal-title': 'Adv. X-Ray Anal.'}
/ Adv. X-Ray Anal. (1999)10.1021/ja01123a039
/ J. Am. Chem. Soc. (1952)10.1039/a700054e
/ J. Mater. Chem. (1997)
Dates
Type | When |
---|---|
Created | 19 years, 6 months ago (Feb. 28, 2006, 6:16 p.m.) |
Deposited | 2 years, 1 month ago (July 2, 2023, 11:04 p.m.) |
Indexed | 1 month ago (July 30, 2025, 6:46 a.m.) |
Issued | 19 years, 6 months ago (Feb. 27, 2006) |
Published | 19 years, 6 months ago (Feb. 27, 2006) |
Published Online | 19 years, 6 months ago (March 1, 2006) |
Published Print | 19 years, 6 months ago (Feb. 27, 2006) |
@article{Matsuzaki_2006, title={Field-induced current modulation in epitaxial film of deep-ultraviolet transparent oxide semiconductor Ga2O3}, volume={88}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.2179373}, DOI={10.1063/1.2179373}, number={9}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Matsuzaki, Kosuke and Yanagi, Hiroshi and Kamiya, Toshio and Hiramatsu, Hidenori and Nomura, Kenji and Hirano, Masahiro and Hosono, Hideo}, year={2006}, month=feb }