Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

Thin films of Al2O3 grown by atomic layer deposition (ALD) were investigated as gas diffusion barriers on flexible polyethylene naphthalate and Kapton® polyimide substrates. Al2O3 ALD films with thicknesses of 1–26nm were grown at 100–175°C. For Al2O3 ALD films with thicknesses ⩾5nm, oxygen transmission rates were below the MOCON instrument test limit of ∼5×10−3cc∕m2∕day. Applying a more sensitive radioactive tracer method, H2O-vapor transmission rates of ∼1×10−3g∕m2∕day were measured for single-sided Al2O3 ALD films with thicknesses of 26nm on the polymers. Ultrathin gas diffusion barriers grown by Al2O3 ALD may enable organic displays and electronics on permeable, flexible polymer substrates.

Bibliography

Groner, M. D., George, S. M., McLean, R. S., & Carcia, P. F. (2006). Gas diffusion barriers on polymers using Al2O3 atomic layer deposition. Applied Physics Letters, 88(5).

Authors 4
  1. M. D. Groner (first)
  2. S. M. George (additional)
  3. R. S. McLean (additional)
  4. P. F. Carcia (additional)
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Dates
Type When
Created 19 years, 6 months ago (Jan. 30, 2006, 6:02 p.m.)
Deposited 2 years, 1 month ago (July 2, 2023, 8:45 p.m.)
Indexed 6 days, 20 hours ago (Aug. 19, 2025, 5:57 a.m.)
Issued 19 years, 6 months ago (Jan. 30, 2006)
Published 19 years, 6 months ago (Jan. 30, 2006)
Published Online 19 years, 6 months ago (Jan. 31, 2006)
Published Print 19 years, 6 months ago (Jan. 30, 2006)
Funders 0

None

@article{Groner_2006, title={Gas diffusion barriers on polymers using Al2O3 atomic layer deposition}, volume={88}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.2168489}, DOI={10.1063/1.2168489}, number={5}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Groner, M. D. and George, S. M. and McLean, R. S. and Carcia, P. F.}, year={2006}, month=jan }