Abstract
Thin films of Al2O3 grown by atomic layer deposition (ALD) were investigated as gas diffusion barriers on flexible polyethylene naphthalate and Kapton® polyimide substrates. Al2O3 ALD films with thicknesses of 1–26nm were grown at 100–175°C. For Al2O3 ALD films with thicknesses ⩾5nm, oxygen transmission rates were below the MOCON instrument test limit of ∼5×10−3cc∕m2∕day. Applying a more sensitive radioactive tracer method, H2O-vapor transmission rates of ∼1×10−3g∕m2∕day were measured for single-sided Al2O3 ALD films with thicknesses of 26nm on the polymers. Ultrathin gas diffusion barriers grown by Al2O3 ALD may enable organic displays and electronics on permeable, flexible polymer substrates.
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Dates
Type | When |
---|---|
Created | 19 years, 6 months ago (Jan. 30, 2006, 6:02 p.m.) |
Deposited | 2 years, 1 month ago (July 2, 2023, 8:45 p.m.) |
Indexed | 6 days, 20 hours ago (Aug. 19, 2025, 5:57 a.m.) |
Issued | 19 years, 6 months ago (Jan. 30, 2006) |
Published | 19 years, 6 months ago (Jan. 30, 2006) |
Published Online | 19 years, 6 months ago (Jan. 31, 2006) |
Published Print | 19 years, 6 months ago (Jan. 30, 2006) |
@article{Groner_2006, title={Gas diffusion barriers on polymers using Al2O3 atomic layer deposition}, volume={88}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.2168489}, DOI={10.1063/1.2168489}, number={5}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Groner, M. D. and George, S. M. and McLean, R. S. and Carcia, P. F.}, year={2006}, month=jan }