DOI: 10.1063/1.2146057. Absence of magnetism in hafnium oxide films

Absence of magnetism in hafnium oxide films

10.1063/1.2146057

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

We establish the limits of magnetism in thin, electronic grade, hafnium oxide, and hafnium silicate films deposited onto silicon wafers by chemical vapor deposition and atomic layer deposition. To the limits of sensitivity of our measurement techniques, no ferromagnetism occurs in these samples. Contamination by handling with stainless-steel tweezers leads to a measurable magnetic signal. The magnetic properties of this contamination are similar to those attributed to ferromagnetic HfO2 in a recent report, including the magnitude of moment, magnetization field dependence, and spatial asymmetry.

Bibliography

Abraham, D. W., Frank, M. M., & Guha, S. (2005). Absence of magnetism in hafnium oxide films. Applied Physics Letters, 87(25).

Authors 3

David W. Abraham (first)
Martin M. Frank (additional)
Supratik Guha (additional)

References 25 Referenced 196

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{'volume-title': 'Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology, and Applications', 'year': '1993', 'key': '2023070301155799200_c8'} / Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology, and Applications (1993)
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{'key': '2023070301155799200_c20'}
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{'key': '2023070301155799200_c23'}
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Dates

Type	When
Created	19 years, 8 months ago (Dec. 21, 2005, 3:20 p.m.)
Deposited	2 years, 1 month ago (July 2, 2023, 9:16 p.m.)
Indexed	2 weeks, 3 days ago (Aug. 6, 2025, 9:46 a.m.)
Issued	19 years, 8 months ago (Dec. 12, 2005)
Published	19 years, 8 months ago (Dec. 12, 2005)
Published Online	19 years, 8 months ago (Dec. 12, 2005)
Published Print	19 years, 8 months ago (Dec. 19, 2005)

Funders 0

None

BibTeX

@article{Abraham_2005, title={Absence of magnetism in hafnium oxide films}, volume={87}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.2146057}, DOI={10.1063/1.2146057}, number={25}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Abraham, David W. and Frank, Martin M. and Guha, Supratik}, year={2005}, month=dec }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2025,
        8,
        6
      ]
    ],
    "date-time": "2025-08-06T13:46:55Z",
    "timestamp": 1754488015949,
    "version": "3.41.2"
  },
  "reference-count": 25,
  "publisher": "AIP Publishing",
  "issue": "25",
  "content-domain": {
    "domain": [
      "pubs.aip.org"
    ],
    "crossmark-restriction": true
  },
  "published-print": {
    "date-parts": [
      [
        2005,
        12,
        19
      ]
    ]
  },
  "abstract": "<jats:p>We establish the limits of magnetism in thin, electronic grade, hafnium oxide, and hafnium silicate films deposited onto silicon wafers by chemical vapor deposition and atomic layer deposition. To the limits of sensitivity of our measurement techniques, no ferromagnetism occurs in these samples. Contamination by handling with stainless-steel tweezers leads to a measurable magnetic signal. The magnetic properties of this contamination are similar to those attributed to ferromagnetic HfO2 in a recent report, including the magnitude of moment, magnetization field dependence, and spatial asymmetry.</jats:p>",
  "DOI": "10.1063/1.2146057",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2005,
        12,
        21
      ]
    ],
    "date-time": "2005-12-21T20:20:18Z",
    "timestamp": 1135196418000
  },
  "update-policy": "https://doi.org/10.1063/aip-crossmark-policy-page",
  "source": "Crossref",
  "is-referenced-by-count": 196,
  "title": "Absence of magnetism in hafnium oxide films",
  "prefix": "10.1063",
  "volume": "87",
  "author": [
    {
      "given": "David W.",
      "family": "Abraham",
      "sequence": "first",
      "affiliation": [
        {
          "name": "IBM Thomas J. Watson Research Center , P.O. Box 218, Yorktown Heights, New York 10598"
        }
      ]
    },
    {
      "given": "Martin M.",
      "family": "Frank",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "IBM Thomas J. Watson Research Center , P.O. Box 218, Yorktown Heights, New York 10598"
        }
      ]
    },
    {
      "given": "Supratik",
      "family": "Guha",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "IBM Thomas J. Watson Research Center , P.O. Box 218, Yorktown Heights, New York 10598"
        }
      ]
    }
  ],
  "member": "317",
  "published-online": {
    "date-parts": [
      [
        2005,
        12,
        12
      ]
    ]
  },
  "reference": [
    {
      "key": "2023070301155799200_c1",
      "doi-asserted-by": "publisher",
      "first-page": "630",
      "DOI": "10.1038/430630a",
      "volume": "430",
      "year": "2004",
      "journal-title": "Nature (London)"
    },
    {
      "key": "2023070301155799200_c2",
      "doi-asserted-by": "publisher",
      "first-page": "3338",
      "DOI": "10.1142/S0217979202014358",
      "volume": "16",
      "year": "2002",
      "journal-title": "Int. J. Mod. Phys. B"
    },
    {
      "key": "2023070301155799200_c3",
      "doi-asserted-by": "publisher",
      "first-page": "1125",
      "DOI": "10.1126/science.1061501",
      "volume": "293",
      "year": "2001",
      "journal-title": "Science"
    },
    {
      "key": "2023070301155799200_c4",
      "doi-asserted-by": "publisher",
      "first-page": "412",
      "DOI": "10.1038/17081",
      "volume": "397",
      "year": "1999",
      "journal-title": "Nature (London)"
    },
    {
      "key": "2023070301155799200_c5",
      "unstructured": "C. D.\u2008Pemmaraju and S.\u2008Sanvito, arXiv:cond-mat/0502246 (2005)."
    },
    {
      "key": "2023070301155799200_c6",
      "doi-asserted-by": "publisher",
      "first-page": "484",
      "DOI": "10.1063/1.371888",
      "volume": "87",
      "year": "2000",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2023070301155799200_c7",
      "doi-asserted-by": "publisher",
      "first-page": "5243",
      "DOI": "10.1063/1.1361065",
      "volume": "89",
      "year": "2001",
      "journal-title": "J. Appl. Phys."
    },
    {
      "volume-title": "Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology, and Applications",
      "year": "1993",
      "key": "2023070301155799200_c8"
    },
    {
      "key": "2023070301155799200_c9",
      "doi-asserted-by": "publisher",
      "first-page": "2104",
      "DOI": "10.1116/1.575980",
      "volume": "7",
      "year": "1989",
      "journal-title": "J. Vac. Sci. Technol. A"
    },
    {
      "key": "2023070301155799200_c10",
      "doi-asserted-by": "publisher",
      "first-page": "2057",
      "DOI": "10.1063/1.1385803",
      "volume": "90",
      "year": "2001",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2023070301155799200_c11",
      "doi-asserted-by": "crossref",
      "first-page": "265",
      "DOI": "10.1147/rd.433.0265",
      "volume": "43",
      "year": "1999",
      "journal-title": "IBM J. Res. Dev."
    },
    {
      "key": "2023070301155799200_c12",
      "doi-asserted-by": "publisher",
      "first-page": "13121",
      "DOI": "10.1021/jp9536763",
      "volume": "100",
      "year": "1996",
      "journal-title": "J. Phys. Chem."
    },
    {
      "key": "2023070301155799200_c13",
      "first-page": "183",
      "volume-title": "Handbook of Thin Film Materials",
      "author": "Nalwa",
      "year": "2002"
    },
    {
      "key": "2023070301155799200_c14",
      "doi-asserted-by": "publisher",
      "first-page": "7168",
      "DOI": "10.1063/1.1522811",
      "volume": "92",
      "year": "2002",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2023070301155799200_c15",
      "doi-asserted-by": "publisher",
      "first-page": "145",
      "DOI": "10.1016/S0167-9317(03)00291-0",
      "volume": "69",
      "year": "2003",
      "journal-title": "Microelectron. Eng."
    },
    {
      "key": "2023070301155799200_c16",
      "doi-asserted-by": "publisher",
      "first-page": "1931",
      "DOI": "10.1063/1.1495847",
      "volume": "117",
      "year": "2002",
      "journal-title": "J. Chem. Phys."
    },
    {
      "key": "2023070301155799200_c17",
      "doi-asserted-by": "publisher",
      "first-page": "2041",
      "DOI": "10.1063/1.1506207",
      "volume": "81",
      "year": "2002",
      "journal-title": "Appl. Phys. Lett."
    },
    {
      "key": "2023070301155799200_c18",
      "doi-asserted-by": "publisher",
      "first-page": "1",
      "DOI": "10.1016/S0040-6090(02)00771-X",
      "volume": "419",
      "year": "2002",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "2023070301155799200_c19"
    },
    {
      "key": "2023070301155799200_c20"
    },
    {
      "key": "2023070301155799200_c21",
      "doi-asserted-by": "publisher",
      "first-page": "177206",
      "DOI": "10.1103/PhysRevLett.93.177206",
      "volume": "93",
      "year": "2004",
      "journal-title": "Phys. Rev. Lett."
    },
    {
      "key": "2023070301155799200_c22",
      "doi-asserted-by": "publisher",
      "first-page": "17269",
      "DOI": "10.1103/PhysRevB.52.17269",
      "volume": "52",
      "year": "1995",
      "journal-title": "Phys. Rev. B"
    },
    {
      "key": "2023070301155799200_c23"
    },
    {
      "key": "2023070301155799200_c24",
      "doi-asserted-by": "publisher",
      "first-page": "1789",
      "DOI": "10.1143/JPSJ.71.1789",
      "volume": "71",
      "year": "2002",
      "journal-title": "J. Phys. Soc. Jpn."
    },
    {
      "key": "2023070301155799200_c25",
      "doi-asserted-by": "publisher",
      "first-page": "287",
      "DOI": "10.1016/S0038-1098(02)00308-3",
      "volume": "123",
      "year": "2002",
      "journal-title": "Solid State Commun."
    }
  ],
  "container-title": "Applied Physics Letters",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://pubs.aip.org/aip/apl/article-pdf/doi/10.1063/1.2146057/14651695/252502_1_online.pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://pubs.aip.org/aip/apl/article-pdf/doi/10.1063/1.2146057/14651695/252502_1_online.pdf",
      "content-type": "unspecified",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2023,
        7,
        3
      ]
    ],
    "date-time": "2023-07-03T01:16:08Z",
    "timestamp": 1688346968000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://pubs.aip.org/apl/article/87/25/252502/330637/Absence-of-magnetism-in-hafnium-oxide-films"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        2005,
        12,
        12
      ]
    ]
  },
  "references-count": 25,
  "journal-issue": {
    "issue": "25",
    "published-print": {
      "date-parts": [
        [
          2005,
          12,
          19
        ]
      ]
    }
  },
  "URL": "http://dx.doi.org/10.1063/1.2146057",
  "relation": {},
  "ISSN": [
    "0003-6951",
    "1077-3118"
  ],
  "subject": [],
  "published-other": {
    "date-parts": [
      [
        2005,
        12,
        19
      ]
    ]
  },
  "published": {
    "date-parts": [
      [
        2005,
        12,
        12
      ]
    ]
  },
  "article-number": "252502"
}