Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

An oxide aperture is used to confine optical modes in a micropillar structure. This method overcomes the limitations due to sidewall scattering loss typical in semiconductor etched micropillars. High cavity quality factors (Q) up to 48 000 are determined by external Fabry–Perot cavity scanning measurements, a significantly higher value than prior work in III-V etched micropillars. Measured Q values and estimated mode volumes correspond to a maximum Purcell factor figure of merit value of 72.

Bibliography

Stoltz, N. G., Rakher, M., Strauf, S., Badolato, A., Lofgreen, D. D., Petroff, P. M., Coldren, L. A., & Bouwmeester, D. (2005). High-quality factor optical microcavities using oxide apertured micropillars. Applied Physics Letters, 87(3).

Authors 8
  1. N. G. Stoltz (first)
  2. M. Rakher (additional)
  3. S. Strauf (additional)
  4. A. Badolato (additional)
  5. D. D. Lofgreen (additional)
  6. P. M. Petroff (additional)
  7. L. A. Coldren (additional)
  8. D. Bouwmeester (additional)
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Dates
Type When
Created 20 years, 1 month ago (July 12, 2005, 6 p.m.)
Deposited 2 years, 1 month ago (July 2, 2023, 4:18 p.m.)
Indexed 4 weeks ago (July 30, 2025, 6:44 a.m.)
Issued 20 years, 1 month ago (July 12, 2005)
Published 20 years, 1 month ago (July 12, 2005)
Published Online 20 years, 1 month ago (July 12, 2005)
Published Print 20 years, 1 month ago (July 18, 2005)
Funders 0

None

@article{Stoltz_2005, title={High-quality factor optical microcavities using oxide apertured micropillars}, volume={87}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1999843}, DOI={10.1063/1.1999843}, number={3}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Stoltz, N. G. and Rakher, M. and Strauf, S. and Badolato, A. and Lofgreen, D. D. and Petroff, P. M. and Coldren, L. A. and Bouwmeester, D.}, year={2005}, month=jul }