Abstract
In this work, quantitative scanning capacitance spectroscopy was applied to investigate the local dielectric properties of a chemical vapor deposition grown ZrO2 layer on low-doped silicon. Due to self-organization effects during the growth process, the ZrO2 layer shows small, periodic thickness variations on micrometer length scales near the sample edges. The measured capacitance data and derived oxide charge densities show the same periodicity as the thickness variations. The magnitude of the change of the oxide charge density, however, cannot be explained by the small thickness variations and is attributed to a local periodic change of the growth dynamics.
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Dates
Type | When |
---|---|
Created | 20 years, 4 months ago (April 12, 2005, 6:01 p.m.) |
Deposited | 2 years, 1 month ago (Aug. 1, 2023, 6:27 a.m.) |
Indexed | 1 month, 1 week ago (July 30, 2025, 6:45 a.m.) |
Issued | 20 years, 4 months ago (April 14, 2005) |
Published | 20 years, 4 months ago (April 14, 2005) |
Published Online | 20 years, 4 months ago (April 14, 2005) |
Published Print | 20 years, 4 months ago (May 1, 2005) |
@article{Brezna_2005, title={Mapping of local oxide properties by quantitative scanning capacitance spectroscopy}, volume={97}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.1881773}, DOI={10.1063/1.1881773}, number={9}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Brezna, W. and Harasek, S. and Lugstein, A. and Leitner, T. and Hoffmann, H. and Bertagnolli, E. and Smoliner, J.}, year={2005}, month=apr }