Abstract
We demonstrate the fabrication of a three-dimensional woodpile photonic crystal in the near-infrared using a layer-by-layer approach involving electron beam lithography and spin on glass planarization. The alignment accuracy between the first and the fifth layer is within 10% of the lattice spacing as measured from cross section scanning-electron-microscopy images. Optical reflectivity measurements reveal peaks consistent with the photonic gap frequency. The method offers a way of rapid prototyping full three-dimensional photonic band gap devices with considerable flexibility of materials choice. Moreover, lattice structure that can operate at wavelengths into the visible can be fabricated using this approach.
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Dates
Type | When |
---|---|
Created | 20 years, 9 months ago (Nov. 23, 2004, 10:21 p.m.) |
Deposited | 1 year, 7 months ago (Feb. 3, 2024, 11:33 p.m.) |
Indexed | 4 weeks, 1 day ago (Aug. 5, 2025, 8:26 a.m.) |
Issued | 20 years, 9 months ago (Nov. 22, 2004) |
Published | 20 years, 9 months ago (Nov. 22, 2004) |
Published Print | 20 years, 9 months ago (Nov. 22, 2004) |
@article{Subramania_2004, title={Fabrication of three-dimensional photonic crystal with alignment based on electron beam lithography}, volume={85}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1825623}, DOI={10.1063/1.1825623}, number={21}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Subramania, G. and Lin, S. Y.}, year={2004}, month=nov, pages={5037–5039} }