Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

We demonstrate the fabrication of a three-dimensional woodpile photonic crystal in the near-infrared using a layer-by-layer approach involving electron beam lithography and spin on glass planarization. The alignment accuracy between the first and the fifth layer is within 10% of the lattice spacing as measured from cross section scanning-electron-microscopy images. Optical reflectivity measurements reveal peaks consistent with the photonic gap frequency. The method offers a way of rapid prototyping full three-dimensional photonic band gap devices with considerable flexibility of materials choice. Moreover, lattice structure that can operate at wavelengths into the visible can be fabricated using this approach.

Bibliography

Subramania, G., & Lin, S. Y. (2004). Fabrication of three-dimensional photonic crystal with alignment based on electron beam lithography. Applied Physics Letters, 85(21), 5037–5039.

Authors 2
  1. G. Subramania (first)
  2. S. Y. Lin (additional)
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Dates
Type When
Created 20 years, 9 months ago (Nov. 23, 2004, 10:21 p.m.)
Deposited 1 year, 7 months ago (Feb. 3, 2024, 11:33 p.m.)
Indexed 4 weeks, 1 day ago (Aug. 5, 2025, 8:26 a.m.)
Issued 20 years, 9 months ago (Nov. 22, 2004)
Published 20 years, 9 months ago (Nov. 22, 2004)
Published Print 20 years, 9 months ago (Nov. 22, 2004)
Funders 0

None

@article{Subramania_2004, title={Fabrication of three-dimensional photonic crystal with alignment based on electron beam lithography}, volume={85}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1825623}, DOI={10.1063/1.1825623}, number={21}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Subramania, G. and Lin, S. Y.}, year={2004}, month=nov, pages={5037–5039} }