Abstract
Strongly p-type ZnO is produced by the following sequence of steps: (1) evaporation of Zn3As2 on a fused-quartz substrate at 350°C; and (2) sputtering of ZnO with substrate held at 450°C. The electrical characteristics include: resistivity of 0.4Ωcm, a mobility of 4cm2∕Vs, and a hole concentration of about 4×1018cm−3. This resistivity is among the best (lowest) ever reported for p-type ZnO. Secondary-ion mass spectroscopic analysis gives an average As concentration about 5×1019cm−3, and a simple one-band fit of the temperature-dependent mobility curve yields an acceptor concentration of about 9×1019cm−3. This is strong evidence that the p-type dopant involves As, although it is not clear whether the acceptor is simply AsO or the recently suggested AsZn−2VZn.
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Dates
Type | When |
---|---|
Created | 20 years, 8 months ago (Dec. 1, 2004, 6:46 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 11:40 p.m.) |
Indexed | 3 months, 3 weeks ago (May 3, 2025, 12:27 p.m.) |
Issued | 20 years, 8 months ago (Nov. 29, 2004) |
Published | 20 years, 8 months ago (Nov. 29, 2004) |
Published Print | 20 years, 8 months ago (Nov. 29, 2004) |
@article{Look_2004, title={As-doped p-type ZnO produced by an evaporation∕sputtering process}, volume={85}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1825615}, DOI={10.1063/1.1825615}, number={22}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Look, D. C. and Renlund, G. M. and Burgener, R. H. and Sizelove, J. R.}, year={2004}, month=nov, pages={5269–5271} }