Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

Strongly p-type ZnO is produced by the following sequence of steps: (1) evaporation of Zn3As2 on a fused-quartz substrate at 350°C; and (2) sputtering of ZnO with substrate held at 450°C. The electrical characteristics include: resistivity of 0.4Ωcm, a mobility of 4cm2∕Vs, and a hole concentration of about 4×1018cm−3. This resistivity is among the best (lowest) ever reported for p-type ZnO. Secondary-ion mass spectroscopic analysis gives an average As concentration about 5×1019cm−3, and a simple one-band fit of the temperature-dependent mobility curve yields an acceptor concentration of about 9×1019cm−3. This is strong evidence that the p-type dopant involves As, although it is not clear whether the acceptor is simply AsO or the recently suggested AsZn−2VZn.

Bibliography

Look, D. C., Renlund, G. M., Burgener, R. H., & Sizelove, J. R. (2004). As-doped p-type ZnO produced by an evaporation∕sputtering process. Applied Physics Letters, 85(22), 5269–5271.

Authors 4
  1. D. C. Look (first)
  2. G. M. Renlund (additional)
  3. R. H. Burgener (additional)
  4. J. R. Sizelove (additional)
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Dates
Type When
Created 20 years, 8 months ago (Dec. 1, 2004, 6:46 p.m.)
Deposited 1 year, 6 months ago (Feb. 3, 2024, 11:40 p.m.)
Indexed 3 months, 3 weeks ago (May 3, 2025, 12:27 p.m.)
Issued 20 years, 8 months ago (Nov. 29, 2004)
Published 20 years, 8 months ago (Nov. 29, 2004)
Published Print 20 years, 8 months ago (Nov. 29, 2004)
Funders 0

None

@article{Look_2004, title={As-doped p-type ZnO produced by an evaporation∕sputtering process}, volume={85}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1825615}, DOI={10.1063/1.1825615}, number={22}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Look, D. C. and Renlund, G. M. and Burgener, R. H. and Sizelove, J. R.}, year={2004}, month=nov, pages={5269–5271} }