DOI: 10.1063/1.1785850. Pulsed photothermal reflectance measurement of the thermal conductivity of sputtered aluminum nitride thin films

Pulsed photothermal reflectance measurement of the thermal conductivity of sputtered aluminum nitride thin films

10.1063/1.1785850

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

We report on measurements of the thermal conductivity of reactively sputtered aluminum nitride (AlN) thin films with different thickness, ranging from 100nm to 1μm, on silicon substrates. The measurements were made at room temperature using the pulsed photothermal reflectance technique. The thermal conductivities of the sample are found to be significantly lower than the single-crystal bulk AlN and increase with an increasing thickness. The thermal resistance at the interface between the AlN film and the silicon substrate is found to be about 7–8×10−8m2K∕W.

Bibliography

Zhao, Y., Zhu, C., Wang, S., Tian, J. Z., Yang, D. J., Chen, C. K., Cheng, H., & Hing, P. (2004). Pulsed photothermal reflectance measurement of the thermal conductivity of sputtered aluminum nitride thin films. Journal of Applied Physics, 96(8), 4563â4568.

Authors 8

Yimin Zhao (first)
Chunlin Zhu (additional)
Sigen Wang (additional)
J. Z. Tian (additional)
D. J. Yang (additional)
C. K. Chen (additional)
Hao Cheng (additional)
Peter Hing (additional)

References 15 Referenced 92

10.1088/0022-3727/31/20/001 / J. Phys. D (1998)
10.1016/0022-3697(87)90153-3 / J. Phys. Chem. Solids (1987)
{'key': '2024020719155687000_c3', 'first-page': '21', 'volume': '134', 'year': '1993', 'journal-title': 'AMD (Am. Soc. Mech. Eng.)'} / AMD (Am. Soc. Mech. Eng.) (1993)
10.1016/0040-6090(94)90324-7 / Thin Solid Films (1994)
10.1063/1.112933 / Appl. Phys. Lett. (1994)
10.1063/1.1661506 / J. Appl. Phys. (1972)
{'key': '2024020719155687000_c7', 'first-page': '426', 'volume': '17', 'year': '1994', 'journal-title': 'IEEE Trans. Compon., Hybrids, Manuf. Technol.'} / IEEE Trans. Compon., Hybrids, Manuf. Technol. (1994)
10.1016/S0040-6090(98)01062-1 / Thin Solid Films (1999)
10.1063/1.336690 / J. Appl. Phys. (1986)
{'key': '2024020719155687000_c10', 'first-page': '76', 'volume': '4', 'year': '1994', 'journal-title': 'Mathematica.'} / Mathematica. (1994)
{'key': '2024020719155687000_c11', 'first-page': '16', 'volume-title': 'Photothermal Science and Techniques', 'year': '1996'} / Photothermal Science and Techniques (1996)
{'key': '2024020719155687000_c12', 'volume-title': 'CRC Materials Science and Engineering Handbook', 'author': 'Shackelford', 'year': '1994', 'edition': '2nd ed.'} / CRC Materials Science and Engineering Handbook by Shackelford (1994)
10.1063/1.98939 / Appl. Phys. Lett. (1987)
10.1103/RevModPhys.61.605 / Rev. Mod. Phys. (1989)
10.1557/JMR.1990.1763 / J. Mater. Res. (1990)

Dates

Type	When
Created	20 years, 10 months ago (Oct. 4, 2004, 6:18 p.m.)
Deposited	1 year, 6 months ago (Feb. 7, 2024, 7:43 p.m.)
Indexed	3 weeks, 4 days ago (Aug. 7, 2025, 4:22 p.m.)
Issued	20 years, 10 months ago (Oct. 15, 2004)
Published	20 years, 10 months ago (Oct. 15, 2004)
Published Print	20 years, 10 months ago (Oct. 15, 2004)

Funders 0

None

BibTeX

@article{Zhao_2004, title={Pulsed photothermal reflectance measurement of the thermal conductivity of sputtered aluminum nitride thin films}, volume={96}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.1785850}, DOI={10.1063/1.1785850}, number={8}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Zhao, Yimin and Zhu, Chunlin and Wang, Sigen and Tian, J. Z. and Yang, D. J. and Chen, C. K. and Cheng, Hao and Hing, Peter}, year={2004}, month=oct, pages={4563–4568} }

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