Abstract
We present results obtained from a study of the admittance of metal-insulator-semiconductor capacitors formed from regioregular poly(3-hexylthiophene). Data obtained over a range of applied bias and frequency can be explained by the presence of a distribution of trapping states at the insulator∕semiconductor interface as observed in metal-oxide-silicon capacitors. We also observe a depletion-bias instability in the threshold voltage, VT, that is consistent with negative charge trapping at the insulator∕polymer interface. The shift can be relaxed by illumination with bandgap light, λ=550nm, suggesting that the instability arises from an electronic process.
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Dates
Type | When |
---|---|
Created | 21 years, 1 month ago (July 8, 2004, 6:51 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 10:34 p.m.) |
Indexed | 4 months, 2 weeks ago (April 16, 2025, 2:13 a.m.) |
Issued | 21 years, 1 month ago (July 12, 2004) |
Published | 21 years, 1 month ago (July 12, 2004) |
Published Print | 21 years, 1 month ago (July 12, 2004) |
@article{Torres_2004, title={Interface states and depletion-induced threshold voltage instabilityin organic metal-insulator-semiconductor structures}, volume={85}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1769081}, DOI={10.1063/1.1769081}, number={2}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Torres, I. and Taylor, D. M. and Itoh, E.}, year={2004}, month=jul, pages={314–316} }