Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

An apparatus is described in which it is possible to obtain simultaneous reflection high-energy electron diffraction and x-ray emission measurements from surfaces. The ultimate vacuum in the electron diffraction section of the apparatus is <10−9 torr so that both chemical and crystallographic information about clean surfaces and surfaces with adsorbed monolayers or thin film reaction products can be acquired. The sensitivity of the apparatus is illustrated with oxygen on the (001) surface of iron.

Bibliography

Sewell, P. B., & Cohen, M. (1967). REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION AND X-RAY EMISSION ANALYSIS OF SURFACES AND THEIR REACTION PRODUCTS. Applied Physics Letters, 11(9), 298–299.

Authors 2
  1. P. B. Sewell (first)
  2. M. Cohen (additional)
References 3 Referenced 31
  1. 10.1080/14786440908520612 / Phil. Mag. (1955)
  2. 10.1063/1.1754284 / Appl. Phys. Letters (1965)
  3. 10.1149/1.2428021 / J. Electrochem. Soc. (1961)
Dates
Type When
Created 20 years, 5 months ago (March 1, 2005, 12:56 p.m.)
Deposited 1 year, 6 months ago (Feb. 5, 2024, 1:31 a.m.)
Indexed 1 month, 2 weeks ago (July 8, 2025, 2:41 p.m.)
Issued 57 years, 9 months ago (Nov. 1, 1967)
Published 57 years, 9 months ago (Nov. 1, 1967)
Published Print 57 years, 9 months ago (Nov. 1, 1967)
Funders 0

None

@article{Sewell_1967, title={REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION AND X-RAY EMISSION ANALYSIS OF SURFACES AND THEIR REACTION PRODUCTS}, volume={11}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1755142}, DOI={10.1063/1.1755142}, number={9}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Sewell, P. B. and Cohen, M.}, year={1967}, month=nov, pages={298–299} }