Abstract
DC channel conductance of a number of experimental MOS transistor structures was measured and results used to calculate the surface state density and field-effect mobility. The mobility was found to increase with decreasing surface state concentration and to approach bulk mobility in samples with the lowest number of surface states. This behavior is shown to be consistent with Coulomb scattering by electrons trapped in surface states.
References
8
Referenced
38
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Dates
Type | When |
---|---|
Created | 20 years, 5 months ago (March 1, 2005, 12:46 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 5, 2024, 1:14 a.m.) |
Indexed | 4 months, 2 weeks ago (April 1, 2025, 2:23 a.m.) |
Issued | 58 years, 9 months ago (Nov. 1, 1966) |
Published | 58 years, 9 months ago (Nov. 1, 1966) |
Published Print | 58 years, 9 months ago (Nov. 1, 1966) |
@article{Arnold_1966, title={EFFECT OF SURFACE STATES ON ELECTRON MOBILITY IN SILICON SURFACE-INVERSION LAYERS}, volume={9}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1754779}, DOI={10.1063/1.1754779}, number={9}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Arnold, Emil and Abowitz, Gerald}, year={1966}, month=nov, pages={344–346} }