DOI: 10.1063/1.1753650. Thermal stability of epitaxial SrRuO3 films as a function of oxygen pressure

Thermal stability of epitaxial SrRuO3 films as a function of oxygen pressure

10.1063/1.1753650

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

The thermal stability of electrically conducting SrRuO3 thin films grown by pulsed-laser deposition on (001) SrTiO3 substrates has been investigated by atomic force microscopy and reflection high-energy electron diffraction (RHEED) under reducing conditions (25–800 °C in 10−7–10−2 Torr O2). The as-grown SrRuO3 epitaxial films exhibit atomically flat surfaces with single unit-cell steps, even after exposure to air at room temperature. The films remain stable at temperatures as high as 720 °C in moderate oxygen ambients (&gt;1 mTorr), but higher temperature anneals at lower pressures result in the formation of islands and pits due to the decomposition of SrRuO3. Using in situ RHEED, a temperature and oxygen pressure stability map was determined, consistent with a thermally activated decomposition process having an activation energy of 88 kJ/mol. The results can be used to determine the proper conditions for growth of additional epitaxial oxide layers on high quality electrically conducting SrRuO3.

Bibliography

Lee, H. N., Christen, H. M., Chisholm, M. F., Rouleau, C. M., & Lowndes, D. H. (2004). Thermal stability of epitaxial SrRuO3 films as a function of oxygen pressure. Applied Physics Letters, 84(20), 4107â4109.

Authors 5

Ho Nyung Lee (first)
Hans M. Christen (additional)
Matthew F. Chisholm (additional)
Christopher M. Rouleau (additional)
Douglas H. Lowndes (additional)

References 17 Referenced 72

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{'key': '2024020403101301700_r10'}
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Dates

Type	When
Created	21 years, 3 months ago (May 6, 2004, 6:24 p.m.)
Deposited	1 year, 6 months ago (Feb. 3, 2024, 10:10 p.m.)
Indexed	2 months, 2 weeks ago (June 6, 2025, 3:05 p.m.)
Issued	21 years, 3 months ago (May 17, 2004)
Published	21 years, 3 months ago (May 17, 2004)
Published Print	21 years, 3 months ago (May 17, 2004)

Funders 0

None

BibTeX

@article{Lee_2004, title={Thermal stability of epitaxial SrRuO3 films as a function of oxygen pressure}, volume={84}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1753650}, DOI={10.1063/1.1753650}, number={20}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Lee, Ho Nyung and Christen, Hans M. and Chisholm, Matthew F. and Rouleau, Christopher M. and Lowndes, Douglas H.}, year={2004}, month=may, pages={4107–4109} }

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