Crossref journal-article
AIP Publishing
Journal of Applied Physics (317)
Abstract

Ion bombardment as a means of cleaning solid surfaces has been tested by applying it to the metal tungsten. The test, which showed the resulting surface to be clean, is a sensitive one because atomically clean tungsten is very reactive to the common gases. The test is definitive since it is performed on a material for which there is overwhelming evidence that another means, namely heating, does produce an atomically clean surface. The phenomenon used in this work to observe surface conditions during the cleaning procedures is the Auger-type ejection of electrons by slowly moving positive ions. This is again shown to be a sensitive means of detecting surface contamination. Data on the electron release by ions from heavily contaminated metal surfaces are reported.

Bibliography

Hagstrum, H. D., & D’Amico, C. (1960). Production and Demonstration of Atomically Clean Metal Surfaces. Journal of Applied Physics, 31(4), 715–723.

Authors 2
  1. H. D. Hagstrum (first)
  2. C. D'Amico (additional)
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Dates
Type When
Created 20 years, 4 months ago (April 25, 2005, 1 p.m.)
Deposited 1 year, 6 months ago (Feb. 1, 2024, 2:20 p.m.)
Indexed 1 year, 5 months ago (March 15, 2024, 2:28 p.m.)
Issued 65 years, 4 months ago (April 1, 1960)
Published 65 years, 4 months ago (April 1, 1960)
Published Print 65 years, 4 months ago (April 1, 1960)
Funders 0

None

@article{Hagstrum_1960, title={Production and Demonstration of Atomically Clean Metal Surfaces}, volume={31}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.1735674}, DOI={10.1063/1.1735674}, number={4}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Hagstrum, H. D. and D’Amico, C.}, year={1960}, month=apr, pages={715–723} }