Crossref journal-article
AIP Publishing
Journal of Applied Physics (317)
Abstract

Tin films less than 800 Å in thickness deposited on 78°K substrates were found to be continuous at low temperatures but to agglomerate into discontinuous islands upon warming to room temperature. Any stage in the agglomeration process could be stabilized by admitting oxygen at a pressure of 10−4 Torr and warming the film to room temperature in the presence of oxygen. Electrical resistance data indicate the surface mobility of the tin is reduced by the formation of a surface oxide one to two monolayers in thickness and that there is no appreciable diffusion of oxygen into the bulk of the film material.

Bibliography

Caswell, H. L., & Budo, Y. (1964). Influence of Oxygen on the Surface Mobility of Tin Atoms in Thin Films. Journal of Applied Physics, 35(3), 644–647.

Authors 2
  1. H. L. Caswell (first)
  2. Y. Budo (additional)
References 13 Referenced 37
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Dates
Type When
Created 20 years, 4 months ago (April 22, 2005, 12:38 p.m.)
Deposited 1 year, 6 months ago (Feb. 2, 2024, 3:15 a.m.)
Indexed 1 year, 6 months ago (Feb. 11, 2024, 4:18 a.m.)
Issued 61 years, 5 months ago (March 1, 1964)
Published 61 years, 5 months ago (March 1, 1964)
Published Print 61 years, 5 months ago (March 1, 1964)
Funders 0

None

@article{Caswell_1964, title={Influence of Oxygen on the Surface Mobility of Tin Atoms in Thin Films}, volume={35}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.1713429}, DOI={10.1063/1.1713429}, number={3}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Caswell, H. L. and Budo, Y.}, year={1964}, month=mar, pages={644–647} }