Abstract
The erasure rate of recorded amorphous marks in nanometers thick SbTe-alloy layers is studied as a function of layer thickness. We point out the presence of an optimum layer thickness where the crystallization speed is maximized. Analysis of the Gibbs free energy of a crystallite embedded in a thin amorphous film indicates that the height of the energy barrier for crystallization is a function of phase-change layer thickness. This barrier increases steeply in thin layers due to the larger surface energy at the crystallized phase-change surface. This suggests that the crystallization speed in thin films may be improved by modifying the interfaces of the phase-change layer.
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Dates
Type | When |
---|---|
Created | 21 years, 4 months ago (March 25, 2004, 6:02 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 7, 2024, 6:50 p.m.) |
Indexed | 1 year, 6 months ago (Feb. 7, 2024, 7:16 p.m.) |
Issued | 21 years, 4 months ago (April 15, 2004) |
Published | 21 years, 4 months ago (April 15, 2004) |
Published Print | 21 years, 4 months ago (April 15, 2004) |
@article{Martens_2004, title={Thickness dependent crystallization speed in thin phase change layers used for optical recording}, volume={95}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.1667606}, DOI={10.1063/1.1667606}, number={8}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Martens, H. C. F. and Vlutters, R. and Prangsma, J. C.}, year={2004}, month=apr, pages={3977–3983} }