Crossref journal-article
AIP Publishing
Journal of Applied Physics (317)
Abstract

When electron currents flow in thermal SiO2 films which have been exposed to water, a buildup of negative charge occurs in the oxide. This paper describes a series of experiments designed to characterize this charging effect. It is found that if water is diffused into a SiO2 film, water related centers are formed which act like electron traps with capture cross section of approximately 1.5 × 10−17 cm2. Experiments are described which show that when one of these centers captures an electron, atomic hydrogen is released which diffuses away and escapes or reacts and a stable negative charge is left behind. Electrochemical charging effects of this type have not previously been considered, although they may play a very important role in some semiconductor device failure effects.

Bibliography

Nicollian, E. H., Berglund, C. N., Schmidt, P. F., & Andrews, J. M. (1971). Electrochemical Charging of Thermal SiO2 Films by Injected Electron Currents. Journal of Applied Physics, 42(13), 5654–5664.

Authors 4
  1. E. H. Nicollian (first)
  2. C. N. Berglund (additional)
  3. P. F. Schmidt (additional)
  4. J. M. Andrews (additional)
References 29 Referenced 370
  1. 10.1063/1.1652955 / Appl. Phys. Letters (1969)
  2. {'key': '2024020203383969500_r2', 'first-page': '871', 'volume': 'ED-17', 'year': '1970', 'journal-title': 'IEEE Trans. Electron. Devices'} / IEEE Trans. Electron. Devices (1970)
  3. 10.1063/1.1652996 / Appl. Phys. Letters (1969)
  4. {'key': '2024020203383969500_r4'}
  5. 10.1063/1.1659364 / J. Appl. Phys. (1970)
  6. 10.1149/1.2423887 / J. Electrochem. Soc. (1966)
  7. 10.1002/j.1538-7305.1967.tb01727.x / Bell System Tech. J. (1967)
  8. {'key': '2024020203383969500_r8'}
  9. 10.1063/1.1709189 / J. Appl. Phys. (1967)
  10. 10.1016/0038-1101(68)90087-7 / Solid-State Electron. (1968)
  11. {'key': '2024020203383969500_r11', 'first-page': '208', 'volume': '28', 'year': '1967', 'journal-title': 'RCA Rev.'} / RCA Rev. (1967)
  12. 10.1109/PROC.1967.5776 / Proc. IEEE (1967)
  13. 10.1149/1.2407603 / J. Electrochem. Soc. (1970)
  14. 10.1149/1.2408122 / J. Electrochem. Soc. (1971)
  15. 10.1149/1.2426537 / J. Electrochem. Soc. (1967)
  16. 10.1016/0039-6028(69)90247-7 / Surface Sci. (1969)
  17. 10.1103/PhysRev.87.835 / Phys. Rev. (1952)
  18. 10.1149/1.2426565 / J. Electrochem. Soc. (1967)
  19. 10.1063/1.1703105 / J. Appl. Phys. (1965)
  20. 10.1063/1.1699825 / J. Appl. Phys. (1951)
  21. {'key': '2024020203383969500_r21', 'first-page': '22', 'volume': '29', 'year': '1968', 'journal-title': 'RCA Rev.'} / RCA Rev. (1968)
  22. 10.1021/j100811a040 / J. Phys. Chem. (1962)
  23. 10.1016/0013-4686(68)80060-X / Electrochim. Acta (1968)
  24. 10.1063/1.1660066 / J. Appl. Phys. (1971)
  25. {'key': '2024020203383969500_r25', 'first-page': '41', 'volume': 'NS-17', 'year': '1970', 'journal-title': 'IEEE Trans. Nucl. Sci.'} / IEEE Trans. Nucl. Sci. (1970)
  26. 10.1002/j.1538-7305.1967.tb01738.x / Bell System Tech. J. (1967)
  27. 10.1109/PROC.1970.7897 / Proc. IEEE (1970)
  28. 10.1016/0038-1101(67)90169-4 / Solid-State Electron. (1967)
  29. 10.1103/PhysRev.140.A569 / Phys. Rev. (1965)
Dates
Type When
Created 21 years, 6 months ago (Feb. 9, 2004, 1:09 p.m.)
Deposited 1 year, 6 months ago (Feb. 1, 2024, 10:39 p.m.)
Indexed 2 weeks, 3 days ago (Aug. 7, 2025, 4:47 p.m.)
Issued 53 years, 8 months ago (Dec. 1, 1971)
Published 53 years, 8 months ago (Dec. 1, 1971)
Published Print 53 years, 8 months ago (Dec. 1, 1971)
Funders 0

None

@article{Nicollian_1971, title={Electrochemical Charging of Thermal SiO2 Films by Injected Electron Currents}, volume={42}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.1659996}, DOI={10.1063/1.1659996}, number={13}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Nicollian, E. H. and Berglund, C. N. and Schmidt, P. F. and Andrews, J. M.}, year={1971}, month=dec, pages={5654–5664} }