DOI: 10.1063/1.1659630. Sputtering and Strain of Silicon by Ion Implantation

Sputtering and Strain of Silicon by Ion Implantation

10.1063/1.1659630

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Bibliography

EerNisse, E. P. (1971). Sputtering and Strain of Silicon by Ion Implantation. Journal of Applied Physics, 42(1), 480â482.

Authors 1

E. P. EerNisse (first)

References 12 Referenced 48

{'key': '2024020202481847600_r1'}
10.1103/PhysRev.184.383 / Phys. Rev. (1969)
10.1063/1.1729057 / J. Appl. Phys. (1963)
10.1002/pssb.19690330134 / Phys. Status Solidi (1969)
10.1063/1.1653443 / Appl. Phys. Lett. (1970)
{'key': '2024020202481847600_r6'}
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{'key': '2024020202481847600_r10'}
10.1139/p68-060 / Can. J. Phys. (1968)
10.1063/1.1735896 / J. Appl. Phys. (1960)

Dates

Type	When
Created	21 years, 6 months ago (Feb. 9, 2004, 1:09 p.m.)
Deposited	1 year, 6 months ago (Feb. 1, 2024, 9:48 p.m.)
Indexed	1 year, 6 months ago (Feb. 5, 2024, 2:57 a.m.)
Issued	54 years, 7 months ago (Jan. 1, 1971)
Published	54 years, 7 months ago (Jan. 1, 1971)
Published Print	54 years, 7 months ago (Jan. 1, 1971)

Funders 0

None

BibTeX

@article{EerNisse_1971, title={Sputtering and Strain of Silicon by Ion Implantation}, volume={42}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.1659630}, DOI={10.1063/1.1659630}, number={1}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={EerNisse, E. P.}, year={1971}, month=jan, pages={480–482} }

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