Abstract
A technique for the determination of relative surface densities of very thin films with an electron microprobe was developed and applied to the measurement of the angular distrubution of aluminum atoms sputtered from a monocrystalline aluminum target by 5–10 keV cesium ions. In all measurements the ion beam was normal to the target surface and the (100) crystallographic plane. Peaks in the distribution were noted at polar angles to the incident beam of 27° and 45°. The distribution exhibited no temperature dependence between 77° and 475°K.
References
7
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Dates
Type | When |
---|---|
Created | 21 years, 6 months ago (Feb. 9, 2004, 11:55 a.m.) |
Deposited | 1 year, 7 months ago (Feb. 2, 2024, 6:15 a.m.) |
Indexed | 1 year, 7 months ago (Feb. 2, 2024, 6:42 a.m.) |
Issued | 57 years, 6 months ago (Feb. 15, 1968) |
Published | 57 years, 6 months ago (Feb. 15, 1968) |
Published Print | 57 years, 6 months ago (Feb. 15, 1968) |
@article{Hasseltine_1968, title={Electron-Microprobe Determination of the Angular Distribution of Sputtered Aluminum Atoms}, volume={39}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.1656373}, DOI={10.1063/1.1656373}, number={3}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Hasseltine, E. H. and Olson, N. Thomas and Smith, Harold P.}, year={1968}, month=feb, pages={1417–1419} }