Abstract
Epitaxial twinned single-crystal films of copper have been grown on sapphire substrates by high vacuum evaporation in the temperature range 240–-375°C. The presence of a twin relationship in copper deposited on the basal plane of sapphire was demonstrated and evaluated by x-ray diffraction techniques. The epitaxy has been shown to be (111)Cu ∥ (0001)α−Al2O3; [21̄1̄)Cu ∥ [21̄1̄0]α−Al2O3. The films have been found to exhibit the bulk metal resistivity.
Dates
Type | When |
---|---|
Created | 21 years, 7 months ago (Jan. 30, 2004, 3:03 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 5, 2024, 1:36 a.m.) |
Indexed | 3 months, 2 weeks ago (May 20, 2025, 7:32 a.m.) |
Issued | 57 years, 6 months ago (March 1, 1968) |
Published | 57 years, 6 months ago (March 1, 1968) |
Published Print | 57 years, 6 months ago (March 1, 1968) |
@article{Katz_1968, title={THE EPITAXY OF COPPER ON SAPPHIRE}, volume={12}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1651935}, DOI={10.1063/1.1651935}, number={5}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Katz, Gerald}, year={1968}, month=mar, pages={161–163} }