Abstract
Field and temperature dependencies of the dark dc hopping conductivity are calculated for an algebraic energy distribution of localized states near the Fermi level. These dependencies are shown to merge in a universal dependence on a field-dependent effective temperature Teff. An analytical expression for Teff is derived. The analytic results agree quantitatively with experimental data obtained by Nebel et al. [Phys. Rev. B 46, 6803 (1992)] for boron- and phosphorous-doped a-Si:H. Although the effective temperature does depend upon a particular choice of the density-of-states (DOS) distribution this dependence is not very strong for DOS functions that are not too steep near the Fermi level.
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Dates
Type | When |
---|---|
Created | 22 years, 3 months ago (May 15, 2003, 7:33 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 9, 2024, 6:10 p.m.) |
Indexed | 1 year, 6 months ago (Feb. 9, 2024, 6:40 p.m.) |
Issued | 22 years, 3 months ago (May 15, 2003) |
Published | 22 years, 3 months ago (May 15, 2003) |
Published Print | 22 years, 3 months ago (May 15, 2003) |
@article{Arkhipov_2003, title={Field-dependent effective temperature and variable range hopping: Application to dark dc conductivity in doped a-Si:H}, volume={93}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.1565673}, DOI={10.1063/1.1565673}, number={10}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Arkhipov, V. I. and Emelianova, E. V. and Adriaenssens, G. J.}, year={2003}, month=may, pages={6150–6153} }