Abstract
AlN layers grown on (111)-oriented silicon substrates were studied by Raman spectroscopy. The deformation potentials of the nonpolar E2(high) phonon mode of hexagonal AlN were derived from phonon frequency shifts under biaxial stress applied to the layer. Stress was applied by mechanical bending of the wafer with resulting in-plane biaxial stress in AlN. The technique allows one to avoid the uncertainty of x-ray diffraction strain determination inherent to experimental methods commonly used for deformation potentials determination in III–V nitrides. The obtained values for the phonon deformation potentials are in reasonably good agreement with previous theoretical calculations. For pure biaxial stress, we determine a phonon frequency shift of 3 cm−1/GPa.
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Dates
Type | When |
---|---|
Created | 22 years, 11 months ago (Sept. 18, 2002, 1:44 p.m.) |
Deposited | 1 year, 7 months ago (Feb. 3, 2024, 5:54 p.m.) |
Indexed | 5 months ago (March 31, 2025, 12:45 p.m.) |
Issued | 23 years ago (Aug. 19, 2002) |
Published | 23 years ago (Aug. 19, 2002) |
Published Print | 23 years ago (Aug. 19, 2002) |
@article{Sarua_2002, title={Deformation potentials of the E2(high) phonon mode of AlN}, volume={81}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1501762}, DOI={10.1063/1.1501762}, number={8}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Sarua, A. and Kuball, M. and Van Nostrand, J. E.}, year={2002}, month=aug, pages={1426–1428} }