Abstract
High-resolution transmission electron microscopy in conjunction with autocorrelation function analysis have been applied to investigate the evolution of structural order in germanium ion-implanted amorphous silicon (a-Si) layers. A high density of Si nanocrystallites as small as 1 nm in size was detected in as-implanted a-Si layers. The density of embedded nanocrystalline Si was found to diminish in a-Si layers with annealing temperature first then increase. The results are discussed in the context of free energy change with annealing temperature.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 28, 2002, 6:05 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 11, 2024, 3:13 a.m.) |
Indexed | 1 year, 3 months ago (May 14, 2024, 9:45 p.m.) |
Issued | 23 years, 1 month ago (July 15, 2002) |
Published | 23 years, 1 month ago (July 15, 2002) |
Published Print | 23 years, 1 month ago (July 15, 2002) |
@article{Cheng_2002, title={Evolution of structural order in germanium ion-implanted amorphous silicon layers}, volume={92}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.1486256}, DOI={10.1063/1.1486256}, number={2}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Cheng, S. L. and Lin, H. H. and He, J. H. and Chiang, T. F. and Yu, C. H. and Chen, L. J. and Yang, C. K. and Wu, D. Y. and Chien, S. C. and Chen, W. C.}, year={2002}, month=jul, pages={910–913} }