Abstract
We report on an extensive study of the two-dimensional electron gas (2DEG) structures containing AlN layers. It is shown that the presence of large polarization fields in the AlN barrier layer in AlN/GaN heterostructures results in high values of the 2DEG sheet density of up to 3.6×1013 cm−2. Room-temperature sheet resistance of 180 Ω/□ is demonstrated in the AlN/GaN structure with a 35 Å AlN barrier. As a result of reduced alloy disorder scattering, low-temperature electron mobility is significantly enhanced in AlN/GaN heterostructures in comparison to AlGaN/GaN structures with similar values of the 2DEG sheet density. The growth of GaN cap layers on top of AlN/GaN structures with relatively thick (∼35 Å) AlN barriers is found to lead to a significant decrease in the 2DEG sheet density. However, inserting a thin (∼10 Å) AlN layer between AlxGa1−xN and GaN in the AlxGa1−xN/GaN (x∼0.2–0.45) 2DEG structures does not affect the 2DEG sheet density and results in an increase of the low-temperature electron mobility in comparison to standard AlGaN/GaN structures. At room temperature, a combination of the high 2DEG sheet density of 2.15×1013 cm−2 and high electron mobility of 1500 cm2/V s in Al0.37Ga0.63N/AlN/GaN yielded a low sheet resistance value of 194 Ω/□.
Bibliography
Smorchkova, I. P., Chen, L., Mates, T., Shen, L., Heikman, S., Moran, B., Keller, S., DenBaars, S. P., Speck, J. S., & Mishra, U. K. (2001). AlN/GaN and (Al,Ga)N/AlN/GaN two-dimensional electron gas structures grown by plasma-assisted molecular-beam epitaxy. Journal of Applied Physics, 90(10), 5196â5201.
References
16
Referenced
274
10.1063/1.354787
/ J. Appl. Phys. (1993)10.1063/1.120852
/ Appl. Phys. Lett. (1998)10.1109/16.906456
/ IEEE Trans. Electron Devices (2001)10.1109/16.906455
/ IEEE Trans. Electron Devices (2001)10.1109/55.658600
/ IEEE Electron Device Lett. (1998)10.1016/S0038-1101(96)00161-X
/ Solid-State Electron. (1997)10.1016/S0022-0248(98)00276-0
/ J. Cryst. Growth (1998)10.1016/S0022-0248(98)00668-X
/ J. Cryst. Growth (1998)10.1049/el:19991407
/ Electron. Lett. (1999)10.1063/1.1332408
/ Appl. Phys. Lett. (2000)10.1063/1.1305830
/ J. Appl. Phys. (2000)10.1063/1.361236
/ J. Appl. Phys. (1996)10.1063/1.336035
/ J. Appl. Phys. (1985)10.1063/1.371396
/ J. Appl. Phys. (1999)10.1063/1.373483
/ J. Appl. Phys. (2000)10.1063/1.1339858
/ J. Appl. Phys. (2001)
Dates
Type | When |
---|---|
Created | 23 years ago (July 26, 2002, 9:27 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 10, 2024, 12:04 p.m.) |
Indexed | 3 months, 1 week ago (May 16, 2025, 8:06 a.m.) |
Issued | 23 years, 9 months ago (Nov. 15, 2001) |
Published | 23 years, 9 months ago (Nov. 15, 2001) |
Published Print | 23 years, 9 months ago (Nov. 15, 2001) |
@article{Smorchkova_2001, title={AlN/GaN and (Al,Ga)N/AlN/GaN two-dimensional electron gas structures grown by plasma-assisted molecular-beam epitaxy}, volume={90}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.1412273}, DOI={10.1063/1.1412273}, number={10}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Smorchkova, I. P. and Chen, L. and Mates, T. and Shen, L. and Heikman, S. and Moran, B. and Keller, S. and DenBaars, S. P. and Speck, J. S. and Mishra, U. K.}, year={2001}, month=nov, pages={5196–5201} }