DOI: 10.1063/1.1406140. Influence of laser intensity and pulse duration on the extreme ultraviolet yield from a water jet target laser plasma

Influence of laser intensity and pulse duration on the extreme ultraviolet yield from a water jet target laser plasma

10.1063/1.1406140

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

Extreme ultraviolet (EUV) emission in the 11–15 nm wavelength range from a thin liquid water jet target under illumination with a high repetition rate, high average power laser (Nd-YLF) has been studied. To find the optimum conversion efficiency of laser light into EUV radiation, different laser parameters were applied. The laser intensity was varied between 1011 and 1015 W/cm2, and pulse duration in the range from 30 ps to 3 ns. A maximum conversion efficiency of 0.12% in 2.2% bandwidth and 4π steradian at 13 nm was achieved at a repetion rate of 250 kHz, and a strong dependence of the conversion efficiency on both laser intensity and pulse duration was found.

Bibliography

Vogt, U., Stiel, H., Will, I., Nickles, P. V., Sandner, W., Wieland, M., & Wilhein, T. (2001). Influence of laser intensity and pulse duration on the extreme ultraviolet yield from a water jet target laser plasma. Applied Physics Letters, 79(15), 2336â2338.

Authors 7

U. Vogt (first)
H. Stiel (additional)
I. Will (additional)
P. V. Nickles (additional)
W. Sandner (additional)
M. Wieland (additional)
T. Wilhein (additional)

References 13 Referenced 27

10.1046/j.1365-2818.2000.00675.x / J. Microsc. (2000)
10.1016/S0030-4018(01)01096-3 / Opt. Commun. (2001)
{'key': '2024020320565748800_r3', 'first-page': '1', 'article-title': 'Emerging Lithographic Technologies IV', 'volume': '3997', 'year': '2000', 'journal-title': 'Proc. SPIE'} / Proc. SPIE / Emerging Lithographic Technologies IV (2000)
10.1016/S0030-4018(97)00421-5 / Opt. Commun. (1998)
{'key': '2024020320565748800_r5', 'first-page': '453', 'volume': '466', 'year': '1999', 'journal-title': 'Microelectron. Eng.'} / Microelectron. Eng. (1999)
10.1117/12.390073 / Proc. SPIE (2000)
{'key': '2024020320565748800_r7', 'first-page': '669', 'volume': '3767', 'year': '1999', 'journal-title': 'Proc. SPIE'} / Proc. SPIE (1999)
10.1016/S0030-4018(00)00946-9 / Opt. Commun. (2000)
10.1016/S0167-9317(00)00401-9 / Microelectron. Eng. (2000)
10.1016/0030-4018(93)90651-K / Opt. Commun. (1993)
10.1109/3.720242 / IEEE J. Quantum Electron. (1998)
10.1063/1.1149653 / Rev. Sci. Instrum. (1999)
10.1117/12.221000 / Proc. SPIE (1995)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:26 a.m.)
Deposited	1 year, 7 months ago (Feb. 3, 2024, 3:57 p.m.)
Indexed	1 year, 2 months ago (June 11, 2024, 3:55 p.m.)
Issued	23 years, 10 months ago (Oct. 8, 2001)
Published	23 years, 10 months ago (Oct. 8, 2001)
Published Print	23 years, 10 months ago (Oct. 8, 2001)

Funders 0

None

BibTeX

@article{Vogt_2001, title={Influence of laser intensity and pulse duration on the extreme ultraviolet yield from a water jet target laser plasma}, volume={79}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1406140}, DOI={10.1063/1.1406140}, number={15}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Vogt, U. and Stiel, H. and Will, I. and Nickles, P. V. and Sandner, W. and Wieland, M. and Wilhein, T.}, year={2001}, month=oct, pages={2336–2338} }

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