Abstract
This letter describes the fabrication and structural and electrical characterization of an aerosol-nanocrystal-based floating-gate field-effect-transistor nonvolatile memory. Aerosol nanocrystal nonvolatile memory devices demonstrate program/erase characteristics comparable to conventional stacked-gate nonvolatile memory devices. Aerosol nanocrystal devices with 0.2 μm channel lengths exhibit large threshold voltage shifts (>3 V), submicrosecond program times, millisecond erase times, excellent endurance (>105 program/erase cycles), and long-term nonvolatility (>106 s) despite thin tunnel oxides (55–60 Å). In addition, a simple aerosol fabrication and deposition process makes the aerosol nanocrystal memory device an attractive candidate for low-cost nonvolatile memory applications.
References
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{'key': '2024020320263692700_r1'}
{'key': '2024020320263692700_r2'}
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:26 a.m.) |
Deposited | 1 year, 7 months ago (Feb. 3, 2024, 3:26 p.m.) |
Indexed | 4 months, 1 week ago (April 26, 2025, 1:24 p.m.) |
Issued | 24 years, 1 month ago (July 16, 2001) |
Published | 24 years, 1 month ago (July 16, 2001) |
Published Print | 24 years, 1 month ago (July 16, 2001) |
@article{Ostraat_2001, title={Synthesis and characterization of aerosol silicon nanocrystal nonvolatile floating-gate memory devices}, volume={79}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1385190}, DOI={10.1063/1.1385190}, number={3}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Ostraat, M. L. and De Blauwe, J. W. and Green, M. L. and Bell, L. D. and Brongersma, M. L. and Casperson, J. and Flagan, R. C. and Atwater, H. A.}, year={2001}, month=jul, pages={433–435} }