Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

We combine a self-organizing diblock copolymer system with semiconductor processing to produce silicon capacitors with increased charge storage capacity over planar structures. Our process uses a diblock copolymer thin film as a mask for dry etching to roughen a silicon surface on a 30 nm length scale, which is well below photolithographic resolution limits. Electron microscopy correlates measured capacitance values with silicon etch depth, and the data agree well with a geometric estimate. This block copolymer nanotemplating process is compatible with standard semiconductor processing techniques and is scalable to large wafer dimensions.

Bibliography

Black, C. T., Guarini, K. W., Milkove, K. R., Baker, S. M., Russell, T. P., & Tuominen, M. T. (2001). Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication. Applied Physics Letters, 79(3), 409–411.

Authors 6
  1. C. T. Black (first)
  2. K. W. Guarini (additional)
  3. K. R. Milkove (additional)
  4. S. M. Baker (additional)
  5. T. P. Russell (additional)
  6. M. T. Tuominen (additional)
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 8:44 a.m.)
Deposited 1 year, 6 months ago (Feb. 3, 2024, 3:27 p.m.)
Indexed 3 months, 3 weeks ago (May 3, 2025, 1:10 a.m.)
Issued 24 years, 1 month ago (July 16, 2001)
Published 24 years, 1 month ago (July 16, 2001)
Published Print 24 years, 1 month ago (July 16, 2001)
Funders 0

None

@article{Black_2001, title={Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication}, volume={79}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1383805}, DOI={10.1063/1.1383805}, number={3}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Black, C. T. and Guarini, K. W. and Milkove, K. R. and Baker, S. M. and Russell, T. P. and Tuominen, M. T.}, year={2001}, month=jul, pages={409–411} }