DOI: 10.1063/1.1378046. Large area dense nanoscale patterning of arbitrary surfaces

Large area dense nanoscale patterning of arbitrary surfaces

10.1063/1.1378046

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

We demonstrate a large-area fabrication of hexagonally ordered metal dot arrays with an area density of ∼1011/cm2. We produced 20 nm dots with a 40 nm period by combining block copolymer nanolithography and a trilayer resist technique. A self-assembled spherical-phase block copolymer top layer spontaneously generated the pattern, acting as a template. The pattern was first transferred to a silicon nitride middle layer by reactive ion etch, producing holes. The nitride layer was then used as a mask to further etch into a polyimide bottom layer. The metal dots were produced by an electron beam evaporation followed by a lift-off process. Our method provides a viable route for highly dense nanoscale patterning of different materials on arbitrary surfaces.

Bibliography

Park, M., Chaikin, P. M., Register, R. A., & Adamson, D. H. (2001). Large area dense nanoscale patterning of arbitrary surfaces. Applied Physics Letters, 79(2), 257â259.

Authors 4

Miri Park (first)
P. M. Chaikin (additional)
Richard A. Register (additional)
Douglas H. Adamson (additional)

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Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 10:18 a.m.)
Deposited	1 year, 6 months ago (Feb. 3, 2024, 3:25 p.m.)
Indexed	4 months ago (April 23, 2025, 4:06 a.m.)
Issued	24 years, 1 month ago (July 9, 2001)
Published	24 years, 1 month ago (July 9, 2001)
Published Print	24 years, 1 month ago (July 9, 2001)

Funders 0

None

BibTeX

@article{Park_2001, title={Large area dense nanoscale patterning of arbitrary surfaces}, volume={79}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1378046}, DOI={10.1063/1.1378046}, number={2}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Park, Miri and Chaikin, P. M. and Register, Richard A. and Adamson, Douglas H.}, year={2001}, month=jul, pages={257–259} }

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