Abstract
GaN layers are grown on sapphire substrates with AlN buffer layers by the metalorganic chemical vapor deposition method. GaN layers are doped with Si. The electron density of the n-type GaN is 2×1017 cm−3. It is found that the GaN surface is etched with hydrogen (H2) plasma produced by supplying microwave power leading to the formation of the roughened surface of GaN. A variation in the surface morphology occurs due to microwave power and gas pressure. Field emission measurements are carried out for GaN with various surface morphologies. It is observed that the turn-on electric field decreases with increasing surface roughness of the GaN. A turn-on electric field of the electron emission is estimated to be as low as 12.4 V/μm.
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Dates
Type | When |
---|---|
Created | 23 years ago (July 26, 2002, 10:17 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 3:08 p.m.) |
Indexed | 11 months, 3 weeks ago (Aug. 29, 2024, 1:49 p.m.) |
Issued | 24 years, 3 months ago (May 21, 2001) |
Published | 24 years, 3 months ago (May 21, 2001) |
Published Print | 24 years, 3 months ago (May 21, 2001) |
@article{Sugino_2001, title={Field emission from GaN surfaces roughened by hydrogen plasma treatment}, volume={78}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1370979}, DOI={10.1063/1.1370979}, number={21}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Sugino, Takashi and Hori, Takamitsu and Kimura, Chiharu and Yamamoto, Tomohide}, year={2001}, month=may, pages={3229–3231} }