Abstract
Fresnel zone plates for high-resolution imaging in the soft x-ray regime were fabricated in nickel by a trilevel process, which makes use of electron-beam lithography, reactive-ion etching, and electrodeposition. In order to improve the zone plate’s resolution, which is determined by its outermost zone width, ZEP-7000 electron-beam resist was employed. Residues, which arose during pattern transfer by reactive-ion etching, and which hindered etching in small structures, were suppressed by a cleaning procedure. For improved electrodeposition process control, a nickel electroplating bath was optimized. Zone plates with minimum outermost zone widths of 20, 25 and 30 nm were fabricated, yielding 9.2%, 16.2% and 18.0% first-order diffraction efficiency, respectively, at λ=2.4 nm.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 10:16 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 2:53 p.m.) |
Indexed | 1 year, 6 months ago (Feb. 6, 2024, 3:56 a.m.) |
Issued | 24 years, 4 months ago (April 9, 2001) |
Published | 24 years, 4 months ago (April 9, 2001) |
Published Print | 24 years, 4 months ago (April 9, 2001) |
@article{Peuker_2001, title={High-efficiency nickel phase zone plates with 20 nm minimum outermost zone width}, volume={78}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1361285}, DOI={10.1063/1.1361285}, number={15}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Peuker, M.}, year={2001}, month=apr, pages={2208–2210} }