Abstract
The density of threading dislocations (TD) in GaN grown directly on flat sapphire substrates is typically greater than 109/cm2. The density of dislocations can be decreased by orders of magnitude using cantilever epitaxy, which employs pre-patterned sapphire substrates to provide reduced-dimension mesa regions for nucleation and etched trenches between them for suspended lateral growth of GaN or AlGaN. The substrate is pre-patterned with narrow lines and etched to a depth that permits coalescence of laterally growing III–N nucleated on the mesa surfaces before vertical growth fills the etched trench. Low-dislocation densities typical of epitaxial lateral overgrowth are obtained in the cantilever regions and the TD density is also reduced up to 1 μm from the edge of the support regions.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 8:41 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 2:07 p.m.) |
Indexed | 4 months, 1 week ago (April 20, 2025, 12:29 a.m.) |
Issued | 24 years, 9 months ago (Nov. 13, 2000) |
Published | 24 years, 9 months ago (Nov. 13, 2000) |
Published Print | 24 years, 9 months ago (Nov. 13, 2000) |
@article{Ashby_2000, title={Low-dislocation-density GaN from a single growth on a textured substrate}, volume={77}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1325394}, DOI={10.1063/1.1325394}, number={20}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Ashby, Carol I. H. and Mitchell, Christine C. and Han, Jung and Missert, Nancy A. and Provencio, Paula P. and Follstaedt, David M. and Peake, Gregory M. and Griego, Leonardo}, year={2000}, month=nov, pages={3233–3235} }