Abstract
High-quality, c-oriented ZnO epitaxial films have been grown on the a surface using molecular-beam epitaxy. The use of a-oriented sapphire eliminates rotational domains and related structural defects which have limited the use of ZnO in electronic applications. The ZnO epitaxial layers are uniquely oriented with the ZnO/sapphire orientational relationship [0001]‖[112̄0] and 〈112̄0〉‖[0001]. This unique orientation is a consequence of the anisotropy of the a-sapphire surface in conjunction with a strong correlation along a single direction leading to the term uniaxial locked epitaxy. High-resolution x-ray diffraction measurements show an increase in x-ray lateral coherence length from several tens of nanometers to >0.7 μm for growth of c-oriented ZnO on the a surface as opposed to the c surface of sapphire.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:43 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 1:46 p.m.) |
Indexed | 1 year, 3 months ago (May 7, 2024, 8:39 a.m.) |
Issued | 24 years, 11 months ago (Sept. 18, 2000) |
Published | 24 years, 11 months ago (Sept. 18, 2000) |
Published Print | 24 years, 11 months ago (Sept. 18, 2000) |
@article{Fons_2000, title={Uniaxial locked epitaxy of ZnO on the a face of sapphire}, volume={77}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1311603}, DOI={10.1063/1.1311603}, number={12}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Fons, P. and Iwata, K. and Yamada, A. and Matsubara, K. and Niki, S. and Nakahara, K. and Tanabe, T. and Takasu, H.}, year={2000}, month=sep, pages={1801–1803} }