Abstract
We have used photoemission methods to directly measure the valence and conduction band offsets at SrTiO3/Si(001) interfaces, as prepared by molecular-beam epitaxy. Within experimental error, the measured values are the same for growth on n- and p-Si, with the entire band discontinuity occurring at the valence band edge. In addition, band bending is much larger at the p-Si heterojunction than at the n-type heterojunction. Previously published threshold voltage behavior for these interfaces can now be understood in light of the present results.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:29 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 1:44 p.m.) |
Indexed | 1 month, 3 weeks ago (July 9, 2025, 7:01 p.m.) |
Issued | 24 years, 11 months ago (Sept. 11, 2000) |
Published | 24 years, 11 months ago (Sept. 11, 2000) |
Published Print | 24 years, 11 months ago (Sept. 11, 2000) |
@article{Chambers_2000, title={Band discontinuities at epitaxial SrTiO3/Si(001) heterojunctions}, volume={77}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.1310209}, DOI={10.1063/1.1310209}, number={11}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Chambers, S. A. and Liang, Y. and Yu, Z. and Droopad, R. and Ramdani, J. and Eisenbeiser, K.}, year={2000}, month=sep, pages={1662–1664} }