DOI: 10.1063/1.125613. Room-temperature imprint lithography by solvent vapor treatment

Room-temperature imprint lithography by solvent vapor treatment

10.1063/1.125613

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

We demonstrate room-temperature nanoimprint lithography using solvent vapor treatment of the polymer film on a substrate. In this method, the film treated with the solvent vapor is pressed with a mold at room temperature, requiring no heating that has been needed for the lithography. We show that the mold or mask patterns down to 60 nm can well be transferred onto the polymer film without any problem of the polymer adhering to the mold. The vapor treatment of the dried polymer film results in lowering both the viscosity and the glass transition temperature, thereby allowing for the room-temperature lithography. This room-temperature imprinting should make the imprint lithography more valuable for practical applications.

Bibliography

Khang, D.-Y., & Lee, H. H. (2000). Room-temperature imprint lithography by solvent vapor treatment. Applied Physics Letters, 76(7), 870â872.

Authors 2

Dahl-Young Khang (first)
Hong H. Lee (additional)

References 16 Referenced 79

{'key': '2024020317372073800_r1'}
10.1063/1.114851 / Appl. Phys. Lett. (1995)
10.1126/science.272.5258.85 / Science (1996)
10.1116/1.589752 / J. Vac. Sci. Technol. B (1997)
10.1116/1.588605 / J. Vac. Sci. Technol. B (1996)
10.1063/1.120280 / Appl. Phys. Lett. (1997)
10.1116/1.590417 / J. Vac. Sci. Technol. B (1998)
10.1116/1.590436 / J. Vac. Sci. Technol. B (1998)
10.1016/S0167-9317(99)00030-1 / Microelectron. Eng. (1999)
10.1016/S0167-9317(99)00031-3 / Microelectron. Eng. (1999)
10.1016/S0167-9317(99)00056-8 / Microelectron. Eng. (1999)
10.1016/S0167-9317(99)00094-5 / Microelectron. Eng. (1999)
10.1016/S0167-9317(99)00126-4 / Microelectron. Eng. (1999)
{'key': '2024020317372073800_r13'}
{'key': '2024020317372073800_r14'}
10.1002/pen.760281502 / Polym. Eng. Sci. (1988)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:29 a.m.)
Deposited	1 year, 7 months ago (Feb. 3, 2024, 12:37 p.m.)
Indexed	3 months, 2 weeks ago (May 21, 2025, 2:26 p.m.)
Issued	25 years, 6 months ago (Feb. 14, 2000)
Published	25 years, 6 months ago (Feb. 14, 2000)
Published Print	25 years, 6 months ago (Feb. 14, 2000)

Funders 0

None

BibTeX

@article{Khang_2000, title={Room-temperature imprint lithography by solvent vapor treatment}, volume={76}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.125613}, DOI={10.1063/1.125613}, number={7}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Khang, Dahl-Young and Lee, Hong H.}, year={2000}, month=feb, pages={870–872} }

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