Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

The high-electric-field-induced trapped oxide charge and neutral oxide traps of a metal–oxide–semiconductor field-effect transistor gate oxide are investigated by surface second-harmonic light generation (SHG). The electric-field dependence of the SHG intensity is sensitive to the charge trapped at the interface between the oxide and the silicon substrate. The time dependence of the SHG intensity probes the characteristics of the neutral trap sites in the oxide.

Bibliography

Fang, J., & Li, G. P. (1999). Detection of gate oxide charge trapping by second-harmonic generation. Applied Physics Letters, 75(22), 3506–3508.

Authors 2
  1. J. Fang (first)
  2. G. P. Li (additional)
References 11 Referenced 17
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:29 a.m.)
Deposited 1 year, 6 months ago (Feb. 3, 2024, 12:18 p.m.)
Indexed 1 year, 6 months ago (Feb. 10, 2024, 10:39 p.m.)
Issued 25 years, 8 months ago (Nov. 29, 1999)
Published 25 years, 8 months ago (Nov. 29, 1999)
Published Print 25 years, 8 months ago (Nov. 29, 1999)
Funders 0

None

@article{Fang_1999, title={Detection of gate oxide charge trapping by second-harmonic generation}, volume={75}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.125370}, DOI={10.1063/1.125370}, number={22}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Fang, J. and Li, G. P.}, year={1999}, month=nov, pages={3506–3508} }