Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

The ferroelectric SrBi2Ta2O9 (SBT) and YMnO3 buffer layers for the metal/ferroelectric/ insulator/semiconductor (MFIS) structure were deposited using pulsed-laser ablation and metalorganic chemical vapor deposition, respectively. Memory windows of the MFIS structure were in the range of 0.3–1.5 V when the gate voltage varied from 2 to 6 V. There were no reactions between ferroelectric SBT and Si in the MFIS structure annealed at 900 °C. The YMnO3 buffer layer plays an important role in alleviating the interdiffusion between elements of SBT and Si. The proposed MFIS structure of Pt/200 nm–SBT/25 nm–YMnO3/Si is attractive for nondestructive read-out ferroelectric random access memory applications.

Bibliography

Choi, K.-J., Shin, W.-C., Yang, J.-H., & Yoon, S.-G. (1999). Metal/ferroelectric/insulator/semiconductor structure of Pt/SrBi2Ta2O9/YMnO3/Si using YMnO3 as the buffer layer. Applied Physics Letters, 75(5), 722–724.

Authors 4
  1. Kyu-Jeong Choi (first)
  2. Woong-Chul Shin (additional)
  3. Jung-Hwan Yang (additional)
  4. Soon-Gil Yoon (additional)
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:29 a.m.)
Deposited 1 year, 6 months ago (Feb. 3, 2024, 11:34 a.m.)
Indexed 4 months, 3 weeks ago (April 10, 2025, 7:09 a.m.)
Issued 26 years ago (Aug. 2, 1999)
Published 26 years ago (Aug. 2, 1999)
Published Print 26 years ago (Aug. 2, 1999)
Funders 0

None

@article{Choi_1999, title={Metal/ferroelectric/insulator/semiconductor structure of Pt/SrBi2Ta2O9/YMnO3/Si using YMnO3 as the buffer layer}, volume={75}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.124255}, DOI={10.1063/1.124255}, number={5}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Choi, Kyu-Jeong and Shin, Woong-Chul and Yang, Jung-Hwan and Yoon, Soon-Gil}, year={1999}, month=aug, pages={722–724} }