Abstract
The ferroelectric SrBi2Ta2O9 (SBT) and YMnO3 buffer layers for the metal/ferroelectric/ insulator/semiconductor (MFIS) structure were deposited using pulsed-laser ablation and metalorganic chemical vapor deposition, respectively. Memory windows of the MFIS structure were in the range of 0.3–1.5 V when the gate voltage varied from 2 to 6 V. There were no reactions between ferroelectric SBT and Si in the MFIS structure annealed at 900 °C. The YMnO3 buffer layer plays an important role in alleviating the interdiffusion between elements of SBT and Si. The proposed MFIS structure of Pt/200 nm–SBT/25 nm–YMnO3/Si is attractive for nondestructive read-out ferroelectric random access memory applications.
References
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:29 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 3, 2024, 11:34 a.m.) |
Indexed | 4 months, 3 weeks ago (April 10, 2025, 7:09 a.m.) |
Issued | 26 years ago (Aug. 2, 1999) |
Published | 26 years ago (Aug. 2, 1999) |
Published Print | 26 years ago (Aug. 2, 1999) |
@article{Choi_1999, title={Metal/ferroelectric/insulator/semiconductor structure of Pt/SrBi2Ta2O9/YMnO3/Si using YMnO3 as the buffer layer}, volume={75}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.124255}, DOI={10.1063/1.124255}, number={5}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Choi, Kyu-Jeong and Shin, Woong-Chul and Yang, Jung-Hwan and Yoon, Soon-Gil}, year={1999}, month=aug, pages={722–724} }