Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

Aluminum nitride thin films have been grown by reactive magnetron sputter technique using a pulsed power supply. The highly (002)-textured columnar films deposited on platinized silicon substrates exhibited quasi-single-crystal piezoelectric properties. The effective d33 was measured as 3.4 pm/V, the effective e31 as 1.0 C/m2. The pyroelectric coefficient turned out to be positive (4.8 μC m−2 K−1) due to a dominating piezoelectric contribution. Thin-film bulk acoustic resonators (TFBAR) with fundamental resonance at 3.6 GHz have been fabricated to assess resonator properties. The material parameters derived from the thickness resonance were a coupling factor k=0.23 and a sound velocity vs=11 400 m/s. With a quality factor Q of 300, the TFBARs proved to be apt for filter applications. The temperature coefficient of the frequency could be tuned to practically 0 ppm/K.

Bibliography

Dubois, M.-A., & Muralt, P. (1999). Properties of aluminum nitride thin films for piezoelectric transducers and microwave filter applications. Applied Physics Letters, 74(20), 3032–3034.

Authors 2
  1. Marc-Alexandre Dubois (first)
  2. Paul Muralt (additional)
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Dates
Type When
Created 23 years ago (July 26, 2002, 9:31 a.m.)
Deposited 1 year, 6 months ago (Feb. 3, 2024, 11:09 a.m.)
Indexed 3 days, 23 hours ago (Aug. 19, 2025, 6:23 a.m.)
Issued 26 years, 3 months ago (May 17, 1999)
Published 26 years, 3 months ago (May 17, 1999)
Published Print 26 years, 3 months ago (May 17, 1999)
Funders 0

None

@article{Dubois_1999, title={Properties of aluminum nitride thin films for piezoelectric transducers and microwave filter applications}, volume={74}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.124055}, DOI={10.1063/1.124055}, number={20}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Dubois, Marc-Alexandre and Muralt, Paul}, year={1999}, month=may, pages={3032–3034} }